Crystallite coalescence: A mechanism for intrinsic tensile stresses in thin films

Journal of Materials Research

Volumn 14, Issue 8, 1999, Pages 3467-3473

  Nix, W D ^a   Clemens, B M ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; ELASTICITY; FILM GROWTH; FREE ENERGY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); MORPHOLOGY; STRAIN; TENSILE STRESS; THIN FILMS;

CRYSTALLITE COALESCENCE;

POLYCRYSTALLINE MATERIALS;

EID: 0032660979     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0468     Document Type: Article

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