-
1
-
-
33847708700
-
Scaling, power, and the future of CMOS
-
Dec.
-
M. Horowitz, E. Alon, D. Patil, S. Naffziger, R. Kumar, and K. Bernstein, "Scaling, power, and the future of CMOS," in IEEE Int. Electron Devices Meeting (IEDM) Tech. Dig., Dec. 2005, p. 9.
-
(2005)
IEEE Int. Electron Devices Meeting (IEDM) Tech. Dig.
, pp. 9
-
-
Horowitz, M.1
Alon, E.2
Patil, D.3
Naffziger, S.4
Kumar, R.5
Bernstein, K.6
-
2
-
-
26244446788
-
Demonstration analysis and device design considerations for independent DG MOSFETs
-
Sep.
-
M. Masahara et al., "Demonstration analysis and device design considerations for independent DG MOSFETs," IEEE Trans. Electron Devices, vol.52, no.9, pp. 2046-2053, Sep. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.9
, pp. 2046-2053
-
-
Masahara, M.1
-
3
-
-
20144387099
-
CMOS vertical multiple independent gate field effect transistor (MIGFET)
-
Oct.
-
L. Mathew, "CMOS vertical multiple independent gate field effect transistor (MIGFET)," in Proc. IEEE Int. SOI Conf., Oct. 2004, pp. 187-189.
-
(2004)
Proc. IEEE Int. SOI Conf.
, pp. 187-189
-
-
Mathew, L.1
-
4
-
-
84942613612
-
A fin-type independent-double-gate NFET
-
Jun.
-
D. Fried, E. Nowak, J. Kedzierski, J. Duster, and K. Komegay, "A fin-type independent-double-gate NFET," in Proc. Device Res. Conf., Jun. 2003, pp. 45-46.
-
(2003)
Proc. Device Res. Conf.
, pp. 45-46
-
-
Fried, D.1
Nowak, E.2
Kedzierski, J.3
Duster, J.4
Komegay, K.5
-
5
-
-
36849035755
-
Analysis of options in double-gate MOS technology: A circuit perspective
-
Dec.
-
R. T. Cakici and K. Roy, "Analysis of options in double-gate MOS technology: A circuit perspective," IEEE Trans. Electron Devices, vol.54, no.12, pp. 3361-3368, Dec. 2007.
-
(2007)
IEEE Trans. Electron Devices
, vol.54
, Issue.12
, pp. 3361-3368
-
-
Cakici, R.T.1
Roy, K.2
-
6
-
-
34249803816
-
Cointegration of high-performance tied-gate three-terminal FinFETs and variable threshold-voltage independent-gate four-terminal FinFETs with asymmetric gate-oxide thicknesses
-
Jun.
-
Y. X. Liu, "Cointegration of high-performance tied-gate three-terminal FinFETs and variable threshold-voltage independent-gate four-terminal FinFETs with asymmetric gate-oxide thicknesses," IEEE Electr. Device Lett., vol.28, no.6, pp. 517-519, Jun. 2007.
-
(2007)
IEEE Electr. Device Lett.
, vol.28
, Issue.6
, pp. 517-519
-
-
Liu, Y.X.1
-
7
-
-
1542605495
-
Full-chip subthreshold leakage power prediction and reduction techniques for sub-0.18-μm CMOS
-
Mar.
-
S. Narendra, V. De, S. Borkar, D. Antoniadis, and A. Chandrakasan, "Full-chip subthreshold leakage power prediction and reduction techniques for sub-0.18-μm CMOS," IEEE J. Solid-State Circuits, vol.39, no.3, pp. 501-510, Mar. 2004.
-
(2004)
IEEE J. Solid-state Circuits
, vol.39
, Issue.3
, pp. 501-510
-
-
Narendra, S.1
De, V.2
Borkar, S.3
Antoniadis, D.4
Chandrakasan, A.5
-
8
-
-
0036477154
-
Leakage control with efficient use of transistor stacks in single threshold CMOS
-
Feb.
-
M. Johnson, D. Somasekhar, L.-Y. Chiou, and K. Roy, "Leakage control with efficient use of transistor stacks in single threshold CMOS," IEEE Trans. Very Large Scale Integr. (VLSI) Syst., vol.10, no.1, pp. 1-5, Feb. 2002.
-
(2002)
IEEE Trans. Very Large Scale Integr. (VLSI) Syst.
, vol.10
, Issue.1
, pp. 1-5
-
-
Johnson, M.1
Somasekhar, D.2
Chiou, L.-Y.3
Roy, K.4
-
9
-
-
0242720765
-
Dynamic sleep transistor and body bias for active leakage power control of microprocessors
-
Nov.
-
J. Tschanz, S. Narendra, Y. Ye, B. Bloechel, S. Borkar, and V. De, "Dynamic sleep transistor and body bias for active leakage power control of microprocessors," IEEE J. Solid-State Circuits, vol.38, no.11, pp. 1838-1845, Nov. 2003.
-
(2003)
IEEE J. Solid-state Circuits
, vol.38
, Issue.11
, pp. 1838-1845
-
-
Tschanz, J.1
Narendra, S.2
Ye, Y.3
Bloechel, B.4
Borkar, S.5
De, V.6
-
10
-
-
33947117331
-
High-density reduced-stack logic circuit techniques using independent-gate controlled double-gate devices
-
Sep.
-
M.-H. Chiang, K. Kim, C.-T. Chuang, and C. Tretz, "High-density reduced-stack logic circuit techniques using independent-gate controlled double-gate devices," IEEE Trans. Electron Devices, vol.53, no.9, pp. 2370-2377, Sep. 2006.
-
(2006)
IEEE Trans. Electron Devices
, vol.53
, Issue.9
, pp. 2370-2377
-
-
Chiang, M.-H.1
Kim, K.2
Chuang, C.-T.3
Tretz, C.4
-
11
-
-
33947421763
-
Physical insights regarding design and performance of independent-gate FinFETs
-
Oct.
-
W. Zhang, J. Fossum, L. Mathew, and Y. Du, "Physical insights regarding design and performance of independent-gate FinFETs," IEEE Trans. Electron Devices, vol.52, no.10, pp. 2198-2206, Oct. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.10
, pp. 2198-2206
-
-
Zhang, W.1
Fossum, J.2
Mathew, L.3
Du, Y.4
-
12
-
-
21644440309
-
A new cell-based performance metric for novel CMOS device architectures
-
Dec.
-
P. Christie, A. Heringa, G. Doornbos, A. Kumar, V. Nguyen, R. Ng, and M. Garg, "A new cell-based performance metric for novel CMOS device architectures," in IEEE Int. Electon Devices Meeting. (IEDM) Tech. Dig., Dec. 2004, pp. 743-746.
-
(2004)
IEEE Int. Electon Devices Meeting. (IEDM) Tech. Dig.
, pp. 743-746
-
-
Christie, P.1
Heringa, A.2
Doornbos, G.3
Kumar, A.4
Nguyen, V.5
Ng, R.6
Garg, M.7
-
13
-
-
39549083652
-
Trading off static power and dynamic performance in CMOS digital circuits: Bulk versus double gate SOI MOSFETs
-
M. Agostinelli, M. Alioto, D. Esseni, and L. Selmi, "Trading off static power and dynamic performance in CMOS digital circuits: Bulk versus double gate SOI MOSFETs," in Proc. 37th ESSDERC, 2007, pp. 191-194.
-
(2007)
Proc. 37th ESSDERC
, pp. 191-194
-
-
Agostinelli, M.1
Alioto, M.2
Esseni, D.3
Selmi, L.4
-
14
-
-
16244385148
-
-
ISE AG, Zurich, ISE TCAD Manuals
-
DESSIS 8.0 User Manual. ISE AG, Zurich, ISE TCAD Manuals, 2002.
-
(2002)
DESSIS 8.0 User Manual
-
-
-
16
-
-
37749005263
-
Low-power and compact sequential circuits with independent-gate FinFETs
-
Jan.
-
S. A. Tawfik and V. Kursun, "Low-power and compact sequential circuits with independent-gate FinFETs," IEEE Trans. Electron Devices, vol.55, no.1, pp. 60-70, Jan. 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.1
, pp. 60-70
-
-
Tawfik, S.A.1
Kursun, V.2
-
17
-
-
0035696689
-
Low field electron and hole mobility of SOI transistors fabricated on ultrathin silicon films for deep submicron technology application
-
Dec.
-
D. Esseni, M. Mastrapasqua, G. Celler, C. Fiegna, L. Selmi, and E. Sangiorgi, "Low field electron and hole mobility of SOI transistors fabricated on ultrathin silicon films for deep submicron technology application," IEEE Trans. Electron Devices, vol.48, no.12, pp. 2842-2850, Dec. 2001.
-
(2001)
IEEE Trans. Electron Devices
, vol.48
, Issue.12
, pp. 2842-2850
-
-
Esseni, D.1
Mastrapasqua, M.2
Celler, G.3
Fiegna, C.4
Selmi, L.5
Sangiorgi, E.6
-
18
-
-
21044449128
-
Analysis of the parasitic s/d resistance in multiple-gate FETs
-
Jun.
-
A. Dixit, A. Kottantharayil, N. Collaert, M. Goodwin, M. Jurczak, and K. De Meyer, "Analysis of the parasitic s/d resistance in multiple-gate FETs," IEEE Trans. Electron Devices, vol.52, no.6, pp. 1132-1140, Jun. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.6
, pp. 1132-1140
-
-
Dixit, A.1
Kottantharayil, A.2
Collaert, N.3
Goodwin, M.4
Jurczak, M.5
De Meyer, K.6
-
19
-
-
3342955721
-
A highly threshold voltage-controllable 4T FinFET with an 8.5-nm-thick Si-fin channel
-
Jul.
-
Y. X. Liu, M. Masahara, K. Ishii, T. Sekigawa, H. Takashima, H. Yamauchi, and E. Suzuki, "A highly threshold voltage-controllable 4T FinFET with an 8.5-nm-thick Si-fin channel," IEEE Electron Device Lett., vol.25, no.7, pp. 510-512, Jul. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.7
, pp. 510-512
-
-
Liu, Y.X.1
Masahara, M.2
Ishii, K.3
Sekigawa, T.4
Takashima, H.5
Yamauchi, H.6
Suzuki, E.7
-
20
-
-
33847343337
-
Short-channel effects in independent-gate Fin-FETs
-
Feb.
-
Z. Lu and J. Fossum, "Short-channel effects in independent-gate Fin-FETs," IEEE Electron Device Lett., vol.28, no.2, pp. 145-147, Feb. 2007.
-
(2007)
IEEE Electron Device Lett.
, vol.28
, Issue.2
, pp. 145-147
-
-
Lu, Z.1
Fossum, J.2
-
22
-
-
84907703268
-
Layout density analysis of FinFET
-
Sep.
-
K. G. Anil, K. Henson, S. Biesemans, and N. Collaert, "Layout density analysis of FinFET," in Proc. 33rd ESSDERC, Sep. 2003, pp. 139-142.
-
(2003)
Proc. 33rd ESSDERC
, pp. 139-142
-
-
Anil, K.G.1
Henson, K.2
Biesemans, S.3
Collaert, N.4
-
24
-
-
0036999969
-
Analysis and comparison on full adder block in submicron technology
-
Dec.
-
M. Alioto and G. Palumbo, "Analysis and comparison on full adder block in submicron technology," IEEE Trans. Very Large Scale Integr. (VLSI) Syst., vol.10, no.6, pp. 806-823, Dec. 2002.
-
(2002)
IEEE Trans. Very Large Scale Integr. (VLSI) Syst.
, vol.10
, Issue.6
, pp. 806-823
-
-
Alioto, M.1
Palumbo, G.2
-
27
-
-
0031635212
-
New technique for standby leakage reduction in high-performance circuits
-
Jun.
-
Y. Ye, S. Borkar, and V. De, "New technique for standby leakage reduction in high-performance circuits," in Symp. VLSI Circuits Dig. Tech. Papers., Jun. 1998, pp. 40-41.
-
(1998)
Symp. VLSI Circuits Dig. Tech. Papers.
, pp. 40-41
-
-
Ye, Y.1
Borkar, S.2
De, V.3
-
29
-
-
17644380683
-
Efficiency of body biasing in 90-nm CMOS for low power digital circuits
-
Sep.
-
K. von Arnim, "Efficiency of body biasing in 90-nm CMOS for low power digital circuits," in Proc. 30th ESSCIRC, Sep. 2004, pp. 175-178.
-
(2004)
Proc. 30th ESSCIRC
, pp. 175-178
-
-
Von Arnim, K.1
-
31
-
-
0032680122
-
Models and algorithms for bounds on leakage in CMOS circuits
-
Jun.
-
M. C. Johnson, D. Somasekhar, and K. Roy, "Models and algorithms for bounds on leakage in CMOS circuits," IEEE Trans. Comput-Aided Des. Integr. Circuits Syst., vol.18, no.6, pp. 714-725, Jun. 1999.
-
(1999)
IEEE Trans. Comput-aided Des. Integr. Circuits Syst.
, vol.18
, Issue.6
, pp. 714-725
-
-
Johnson, M.C.1
Somasekhar, D.2
Roy, K.3
-
32
-
-
0034230287
-
Dual-threshold voltage techniques for low-power digital circuits
-
Jul.
-
J. Kao and A. Chandrakasan, "Dual-threshold voltage techniques for low-power digital circuits," IEEE J. Solid-State Circuits, vol.35, no.7, pp. 1009-1018, Jul. 2000.
-
(2000)
IEEE J. Solid-state Circuits
, vol.35
, Issue.7
, pp. 1009-1018
-
-
Kao, J.1
Chandrakasan, A.2
-
33
-
-
0034867611
-
Scaling of stack effect and its application for leakage reduction
-
Aug.
-
S. Narendra, S. Borkar, V. De, D. Antoniadis, and A. Chandrakasan, "Scaling of stack effect and its application for leakage reduction," in Proc. ISLPED, Aug. 2001, pp. 195-200.
-
(2001)
Proc. ISLPED
, pp. 195-200
-
-
Narendra, S.1
Borkar, S.2
De, V.3
Antoniadis, D.4
Chandrakasan, A.5
-
34
-
-
27744543352
-
Failure of moments-based transport models in nanoscale devices near equilibrium
-
Nov.
-
C. Jungemann, T. Grasser, B. Neinhus, and B. Meinerzhagen, "Failure of moments-based transport models in nanoscale devices near equilibrium," IEEE Trans. Electron Devices, vol.52, no.11, pp. 2404-2408, Nov. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.11
, pp. 2404-2408
-
-
Jungemann, C.1
Grasser, T.2
Neinhus, B.3
Meinerzhagen, B.4
-
35
-
-
25844509428
-
Advanced transport models for submicrometer devices
-
T. Grasser, H. Jungemann, C. Kosina, B. Meinerzhagen, and S. Selberherr, "Advanced transport models for submicrometer devices," in Proc. Int. Conf. Simul. Semicond. Process. Devices, 2004, pp. 1-8.
-
(2004)
Proc. Int. Conf. Simul. Semicond. Process. Devices
, pp. 1-8
-
-
Grasser, T.1
Jungemann, H.2
Kosina, C.3
Meinerzhagen, B.4
Selberherr, S.5
-
36
-
-
0037480885
-
Extension and source/drain design for high-performance FinFET devices
-
Apr.
-
J. Kedzierski, "Extension and source/drain design for high-performance FinFET devices," IEEE Trans. Electron Devices, vol.50, no.4, pp. 952-958, Apr. 2003.
-
(2003)
IEEE Trans. Electron Devices
, vol.50
, Issue.4
, pp. 952-958
-
-
Kedzierski, J.1
-
37
-
-
33751414310
-
Double-gate SOI devices for low-power and high-performance applications
-
Nov.
-
K. Roy, H. Mahmoodi, S. Mukhopadhyay, H. Ananthan, A. Bansal, and T. Cakici, "Double-gate SOI devices for low-power and high-performance applications," in Proc. ICCAD, Nov. 2005, pp. 217-224.
-
(2005)
Proc. ICCAD
, pp. 217-224
-
-
Roy, K.1
Mahmoodi, H.2
Mukhopadhyay, S.3
Ananthan, H.4
Bansal, A.5
Cakici, T.6
-
38
-
-
1542359166
-
Optimal body bias selection for leakage improvement and process compensation over different technology generations
-
Aug.
-
C. Neau and K. Roy, "Optimal body bias selection for leakage improvement and process compensation over different technology generations," in Proc. ISLPED, Aug. 2003, pp. 116-121.
-
(2003)
Proc. ISLPED
, pp. 116-121
-
-
Neau, C.1
Roy, K.2
-
39
-
-
0033359156
-
Technology scaling behavior of optimum reverse body bias for standby leakage power reduction in CMOS IC's
-
A. Keshavarzi, S. Narendra, S. Borkar, C. Hawkind, K. Roy, and V. De, "Technology scaling behavior of optimum reverse body bias for standby leakage power reduction in CMOS IC's," in Proc. ISLPED, 1999, pp. 252-254.
-
(1999)
Proc. ISLPED
, pp. 252-254
-
-
Keshavarzi, A.1
Narendra, S.2
Borkar, S.3
Hawkind, C.4
Roy, K.5
De, V.6
-
40
-
-
33846118707
-
Comparison of modeling approaches for the capacitancevoltage and current-voltage characteristics of advanced gate stacks
-
Jan.
-
P. Palestri, "Comparison of modeling approaches for the capacitancevoltage and current-voltage characteristics of advanced gate stacks," IEEE Trans. Electron Devices, vol.54, no.1, pp. 106-114, Jan. 2007.
-
(2007)
IEEE Trans. Electron Devices
, vol.54
, Issue.1
, pp. 106-114
-
-
Palestri, P.1
-
41
-
-
0035872897
-
High-k gate dielectrics: Current status and materials properties considerations
-
May
-
G. D. Wilk, R. M. Wallace, and J. M. Anthony, "High-k gate dielectrics: Current status and materials properties considerations," J. Appl. Phys., vol.89, no.10, pp. 5243-5275, May 2001.
-
(2001)
J. Appl. Phys.
, vol.89
, Issue.10
, pp. 5243-5275
-
-
Wilk, G.D.1
Wallace, R.M.2
Anthony, J.M.3
-
42
-
-
0041537580
-
Transistor elements for 30-nm physical gate length and beyond
-
B. Doyle, "Transistor elements for 30-nm physical gate length and beyond," Intel. Technol. J, vol.6, no.2, pp. 42-53, 2002.
-
(2002)
Intel. Technol. J
, vol.6
, Issue.2
, pp. 42-53
-
-
Doyle, B.1
-
43
-
-
0032049972
-
Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's
-
Apr.
-
M.-J. Chen, H.-T. Huang, C.-S. Hou, and K.-N. Yang, "Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's," IEEE Electron Device Lett., vol.19, no.4, pp. 134-136, Apr. 1998.
-
(1998)
IEEE Electron Device Lett.
, vol.19
, Issue.4
, pp. 134-136
-
-
Chen, M.-J.1
Huang, H.-T.2
Hou, C.-S.3
Yang, K.-N.4
-
44
-
-
0030284603
-
Different dependence of band-to-band and Fowler-Nordheim tunneling on source doping concentration of an n-MOSFET
-
Nov.
-
Y. Tang, "Different dependence of band-to-band and Fowler-Nordheim tunneling on source doping concentration of an n-MOSFET," IEEE Electron Device Lett., vol.17, no.11, pp. 525-527, Nov. 1996.
-
(1996)
IEEE Electron Device Lett.
, vol.17
, Issue.11
, pp. 525-527
-
-
Tang, Y.1
-
45
-
-
0026819795
-
A new recombination model for device simulation including tunneling
-
Feb.
-
G. Hurkx, D. Klaassen, and M. Knuvers, "A new recombination model for device simulation including tunneling," IEEE Trans. Electron Devices, vol.39, no.2, pp. 331-338, Feb. 1992.
-
(1992)
IEEE Trans. Electron Devices
, vol.39
, Issue.2
, pp. 331-338
-
-
Hurkx, G.1
Klaassen, D.2
Knuvers, M.3
-
46
-
-
75549089115
-
Drain leakage mechanisms in fully depleted SOI devices with undoped channel MOSFETs
-
Sep.
-
R. Luyken, "Drain leakage mechanisms in fully depleted SOI devices with undoped channel MOSFETs," in Proc. 33rd ESSDERC, Sep. 2003, pp. 419-422.
-
(2003)
Proc. 33rd ESSDERC
, pp. 419-422
-
-
Luyken, R.1
-
47
-
-
0142217024
-
Impact ionization and band-to-band tunneling in ultrathin body SOI devices with undoped channels
-
Sep.
-
R. Luyken, "Impact ionization and band-to-band tunneling in ultrathin body SOI devices with undoped channels," in Proc. IEEE Int. SOI Conf., Sep. 2003, pp. 166-167.
-
(2003)
Proc. IEEE Int. SOI Conf.
, pp. 166-167
-
-
Luyken, R.1
-
48
-
-
42549117204
-
Band to band tunneling limited off state current in ultrathin body double gate FETs with high mobility materials: III-V, Ge and strained Si/Ge
-
Sep.
-
D. Kim, T. Krishnamohan, Y. Nishi, and K. Saraswat, "Band to band tunneling limited off state current in ultrathin body double gate FETs with high mobility materials: III-V, Ge and strained Si/Ge," in Proc. Int. Conf. Simul. Semicond. Process. Devices, Sep. 2006, pp. 389-392.
-
(2006)
Proc. Int. Conf. Simul. Semicond. Process. Devices
, pp. 389-392
-
-
Kim, D.1
Krishnamohan, T.2
Nishi, Y.3
Saraswat, K.4
|