메뉴 건너뛰기




Volumn 18, Issue 2, 2010, Pages 232-245

Leakage-delay tradeoff in finfet logic circuits: A comparative analysis with bulk technology

Author keywords

Back biasing; Double gate MOSFETs; Fin FETs (FinFETs); Independent gates; Leakage reduction; Stack effect

Indexed keywords

BULK MOSFET; BULK TECHNOLOGIES; CIRCUIT LEVELS; COMPARATIVE ANALYSIS; DOUBLE-GATE MOSFETS; DYNAMIC PERFORMANCE; ENERGY EFFICIENT; FIGURES OF MERITS; FINFETS; FULL ADDERS; GATE CIRCUIT; LEAKAGE REDUCTION; LOW STAND-BY POWER; RING OSCILLATOR; STACK EFFECT; STANDBY POWER;

EID: 75549083819     PISSN: 10638210     EISSN: None     Source Type: Journal    
DOI: 10.1109/TVLSI.2008.2009633     Document Type: Article
Times cited : (69)

References (48)
  • 2
    • 26244446788 scopus 로고    scopus 로고
    • Demonstration analysis and device design considerations for independent DG MOSFETs
    • Sep.
    • M. Masahara et al., "Demonstration analysis and device design considerations for independent DG MOSFETs," IEEE Trans. Electron Devices, vol.52, no.9, pp. 2046-2053, Sep. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.9 , pp. 2046-2053
    • Masahara, M.1
  • 3
    • 20144387099 scopus 로고    scopus 로고
    • CMOS vertical multiple independent gate field effect transistor (MIGFET)
    • Oct.
    • L. Mathew, "CMOS vertical multiple independent gate field effect transistor (MIGFET)," in Proc. IEEE Int. SOI Conf., Oct. 2004, pp. 187-189.
    • (2004) Proc. IEEE Int. SOI Conf. , pp. 187-189
    • Mathew, L.1
  • 5
    • 36849035755 scopus 로고    scopus 로고
    • Analysis of options in double-gate MOS technology: A circuit perspective
    • Dec.
    • R. T. Cakici and K. Roy, "Analysis of options in double-gate MOS technology: A circuit perspective," IEEE Trans. Electron Devices, vol.54, no.12, pp. 3361-3368, Dec. 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.12 , pp. 3361-3368
    • Cakici, R.T.1    Roy, K.2
  • 6
    • 34249803816 scopus 로고    scopus 로고
    • Cointegration of high-performance tied-gate three-terminal FinFETs and variable threshold-voltage independent-gate four-terminal FinFETs with asymmetric gate-oxide thicknesses
    • Jun.
    • Y. X. Liu, "Cointegration of high-performance tied-gate three-terminal FinFETs and variable threshold-voltage independent-gate four-terminal FinFETs with asymmetric gate-oxide thicknesses," IEEE Electr. Device Lett., vol.28, no.6, pp. 517-519, Jun. 2007.
    • (2007) IEEE Electr. Device Lett. , vol.28 , Issue.6 , pp. 517-519
    • Liu, Y.X.1
  • 7
    • 1542605495 scopus 로고    scopus 로고
    • Full-chip subthreshold leakage power prediction and reduction techniques for sub-0.18-μm CMOS
    • Mar.
    • S. Narendra, V. De, S. Borkar, D. Antoniadis, and A. Chandrakasan, "Full-chip subthreshold leakage power prediction and reduction techniques for sub-0.18-μm CMOS," IEEE J. Solid-State Circuits, vol.39, no.3, pp. 501-510, Mar. 2004.
    • (2004) IEEE J. Solid-state Circuits , vol.39 , Issue.3 , pp. 501-510
    • Narendra, S.1    De, V.2    Borkar, S.3    Antoniadis, D.4    Chandrakasan, A.5
  • 9
    • 0242720765 scopus 로고    scopus 로고
    • Dynamic sleep transistor and body bias for active leakage power control of microprocessors
    • Nov.
    • J. Tschanz, S. Narendra, Y. Ye, B. Bloechel, S. Borkar, and V. De, "Dynamic sleep transistor and body bias for active leakage power control of microprocessors," IEEE J. Solid-State Circuits, vol.38, no.11, pp. 1838-1845, Nov. 2003.
    • (2003) IEEE J. Solid-state Circuits , vol.38 , Issue.11 , pp. 1838-1845
    • Tschanz, J.1    Narendra, S.2    Ye, Y.3    Bloechel, B.4    Borkar, S.5    De, V.6
  • 10
    • 33947117331 scopus 로고    scopus 로고
    • High-density reduced-stack logic circuit techniques using independent-gate controlled double-gate devices
    • Sep.
    • M.-H. Chiang, K. Kim, C.-T. Chuang, and C. Tretz, "High-density reduced-stack logic circuit techniques using independent-gate controlled double-gate devices," IEEE Trans. Electron Devices, vol.53, no.9, pp. 2370-2377, Sep. 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.9 , pp. 2370-2377
    • Chiang, M.-H.1    Kim, K.2    Chuang, C.-T.3    Tretz, C.4
  • 11
    • 33947421763 scopus 로고    scopus 로고
    • Physical insights regarding design and performance of independent-gate FinFETs
    • Oct.
    • W. Zhang, J. Fossum, L. Mathew, and Y. Du, "Physical insights regarding design and performance of independent-gate FinFETs," IEEE Trans. Electron Devices, vol.52, no.10, pp. 2198-2206, Oct. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.10 , pp. 2198-2206
    • Zhang, W.1    Fossum, J.2    Mathew, L.3    Du, Y.4
  • 13
    • 39549083652 scopus 로고    scopus 로고
    • Trading off static power and dynamic performance in CMOS digital circuits: Bulk versus double gate SOI MOSFETs
    • M. Agostinelli, M. Alioto, D. Esseni, and L. Selmi, "Trading off static power and dynamic performance in CMOS digital circuits: Bulk versus double gate SOI MOSFETs," in Proc. 37th ESSDERC, 2007, pp. 191-194.
    • (2007) Proc. 37th ESSDERC , pp. 191-194
    • Agostinelli, M.1    Alioto, M.2    Esseni, D.3    Selmi, L.4
  • 14
    • 16244385148 scopus 로고    scopus 로고
    • ISE AG, Zurich, ISE TCAD Manuals
    • DESSIS 8.0 User Manual. ISE AG, Zurich, ISE TCAD Manuals, 2002.
    • (2002) DESSIS 8.0 User Manual
  • 16
    • 37749005263 scopus 로고    scopus 로고
    • Low-power and compact sequential circuits with independent-gate FinFETs
    • Jan.
    • S. A. Tawfik and V. Kursun, "Low-power and compact sequential circuits with independent-gate FinFETs," IEEE Trans. Electron Devices, vol.55, no.1, pp. 60-70, Jan. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.1 , pp. 60-70
    • Tawfik, S.A.1    Kursun, V.2
  • 17
    • 0035696689 scopus 로고    scopus 로고
    • Low field electron and hole mobility of SOI transistors fabricated on ultrathin silicon films for deep submicron technology application
    • Dec.
    • D. Esseni, M. Mastrapasqua, G. Celler, C. Fiegna, L. Selmi, and E. Sangiorgi, "Low field electron and hole mobility of SOI transistors fabricated on ultrathin silicon films for deep submicron technology application," IEEE Trans. Electron Devices, vol.48, no.12, pp. 2842-2850, Dec. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , Issue.12 , pp. 2842-2850
    • Esseni, D.1    Mastrapasqua, M.2    Celler, G.3    Fiegna, C.4    Selmi, L.5    Sangiorgi, E.6
  • 20
    • 33847343337 scopus 로고    scopus 로고
    • Short-channel effects in independent-gate Fin-FETs
    • Feb.
    • Z. Lu and J. Fossum, "Short-channel effects in independent-gate Fin-FETs," IEEE Electron Device Lett., vol.28, no.2, pp. 145-147, Feb. 2007.
    • (2007) IEEE Electron Device Lett. , vol.28 , Issue.2 , pp. 145-147
    • Lu, Z.1    Fossum, J.2
  • 24
    • 0036999969 scopus 로고    scopus 로고
    • Analysis and comparison on full adder block in submicron technology
    • Dec.
    • M. Alioto and G. Palumbo, "Analysis and comparison on full adder block in submicron technology," IEEE Trans. Very Large Scale Integr. (VLSI) Syst., vol.10, no.6, pp. 806-823, Dec. 2002.
    • (2002) IEEE Trans. Very Large Scale Integr. (VLSI) Syst. , vol.10 , Issue.6 , pp. 806-823
    • Alioto, M.1    Palumbo, G.2
  • 27
    • 0031635212 scopus 로고    scopus 로고
    • New technique for standby leakage reduction in high-performance circuits
    • Jun.
    • Y. Ye, S. Borkar, and V. De, "New technique for standby leakage reduction in high-performance circuits," in Symp. VLSI Circuits Dig. Tech. Papers., Jun. 1998, pp. 40-41.
    • (1998) Symp. VLSI Circuits Dig. Tech. Papers. , pp. 40-41
    • Ye, Y.1    Borkar, S.2    De, V.3
  • 29
    • 17644380683 scopus 로고    scopus 로고
    • Efficiency of body biasing in 90-nm CMOS for low power digital circuits
    • Sep.
    • K. von Arnim, "Efficiency of body biasing in 90-nm CMOS for low power digital circuits," in Proc. 30th ESSCIRC, Sep. 2004, pp. 175-178.
    • (2004) Proc. 30th ESSCIRC , pp. 175-178
    • Von Arnim, K.1
  • 32
    • 0034230287 scopus 로고    scopus 로고
    • Dual-threshold voltage techniques for low-power digital circuits
    • Jul.
    • J. Kao and A. Chandrakasan, "Dual-threshold voltage techniques for low-power digital circuits," IEEE J. Solid-State Circuits, vol.35, no.7, pp. 1009-1018, Jul. 2000.
    • (2000) IEEE J. Solid-state Circuits , vol.35 , Issue.7 , pp. 1009-1018
    • Kao, J.1    Chandrakasan, A.2
  • 33
    • 0034867611 scopus 로고    scopus 로고
    • Scaling of stack effect and its application for leakage reduction
    • Aug.
    • S. Narendra, S. Borkar, V. De, D. Antoniadis, and A. Chandrakasan, "Scaling of stack effect and its application for leakage reduction," in Proc. ISLPED, Aug. 2001, pp. 195-200.
    • (2001) Proc. ISLPED , pp. 195-200
    • Narendra, S.1    Borkar, S.2    De, V.3    Antoniadis, D.4    Chandrakasan, A.5
  • 34
    • 27744543352 scopus 로고    scopus 로고
    • Failure of moments-based transport models in nanoscale devices near equilibrium
    • Nov.
    • C. Jungemann, T. Grasser, B. Neinhus, and B. Meinerzhagen, "Failure of moments-based transport models in nanoscale devices near equilibrium," IEEE Trans. Electron Devices, vol.52, no.11, pp. 2404-2408, Nov. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.11 , pp. 2404-2408
    • Jungemann, C.1    Grasser, T.2    Neinhus, B.3    Meinerzhagen, B.4
  • 36
    • 0037480885 scopus 로고    scopus 로고
    • Extension and source/drain design for high-performance FinFET devices
    • Apr.
    • J. Kedzierski, "Extension and source/drain design for high-performance FinFET devices," IEEE Trans. Electron Devices, vol.50, no.4, pp. 952-958, Apr. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.4 , pp. 952-958
    • Kedzierski, J.1
  • 38
    • 1542359166 scopus 로고    scopus 로고
    • Optimal body bias selection for leakage improvement and process compensation over different technology generations
    • Aug.
    • C. Neau and K. Roy, "Optimal body bias selection for leakage improvement and process compensation over different technology generations," in Proc. ISLPED, Aug. 2003, pp. 116-121.
    • (2003) Proc. ISLPED , pp. 116-121
    • Neau, C.1    Roy, K.2
  • 39
    • 0033359156 scopus 로고    scopus 로고
    • Technology scaling behavior of optimum reverse body bias for standby leakage power reduction in CMOS IC's
    • A. Keshavarzi, S. Narendra, S. Borkar, C. Hawkind, K. Roy, and V. De, "Technology scaling behavior of optimum reverse body bias for standby leakage power reduction in CMOS IC's," in Proc. ISLPED, 1999, pp. 252-254.
    • (1999) Proc. ISLPED , pp. 252-254
    • Keshavarzi, A.1    Narendra, S.2    Borkar, S.3    Hawkind, C.4    Roy, K.5    De, V.6
  • 40
    • 33846118707 scopus 로고    scopus 로고
    • Comparison of modeling approaches for the capacitancevoltage and current-voltage characteristics of advanced gate stacks
    • Jan.
    • P. Palestri, "Comparison of modeling approaches for the capacitancevoltage and current-voltage characteristics of advanced gate stacks," IEEE Trans. Electron Devices, vol.54, no.1, pp. 106-114, Jan. 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.1 , pp. 106-114
    • Palestri, P.1
  • 41
    • 0035872897 scopus 로고    scopus 로고
    • High-k gate dielectrics: Current status and materials properties considerations
    • May
    • G. D. Wilk, R. M. Wallace, and J. M. Anthony, "High-k gate dielectrics: Current status and materials properties considerations," J. Appl. Phys., vol.89, no.10, pp. 5243-5275, May 2001.
    • (2001) J. Appl. Phys. , vol.89 , Issue.10 , pp. 5243-5275
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 42
    • 0041537580 scopus 로고    scopus 로고
    • Transistor elements for 30-nm physical gate length and beyond
    • B. Doyle, "Transistor elements for 30-nm physical gate length and beyond," Intel. Technol. J, vol.6, no.2, pp. 42-53, 2002.
    • (2002) Intel. Technol. J , vol.6 , Issue.2 , pp. 42-53
    • Doyle, B.1
  • 43
    • 0032049972 scopus 로고    scopus 로고
    • Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's
    • Apr.
    • M.-J. Chen, H.-T. Huang, C.-S. Hou, and K.-N. Yang, "Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's," IEEE Electron Device Lett., vol.19, no.4, pp. 134-136, Apr. 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , Issue.4 , pp. 134-136
    • Chen, M.-J.1    Huang, H.-T.2    Hou, C.-S.3    Yang, K.-N.4
  • 44
    • 0030284603 scopus 로고    scopus 로고
    • Different dependence of band-to-band and Fowler-Nordheim tunneling on source doping concentration of an n-MOSFET
    • Nov.
    • Y. Tang, "Different dependence of band-to-band and Fowler-Nordheim tunneling on source doping concentration of an n-MOSFET," IEEE Electron Device Lett., vol.17, no.11, pp. 525-527, Nov. 1996.
    • (1996) IEEE Electron Device Lett. , vol.17 , Issue.11 , pp. 525-527
    • Tang, Y.1
  • 45
    • 0026819795 scopus 로고
    • A new recombination model for device simulation including tunneling
    • Feb.
    • G. Hurkx, D. Klaassen, and M. Knuvers, "A new recombination model for device simulation including tunneling," IEEE Trans. Electron Devices, vol.39, no.2, pp. 331-338, Feb. 1992.
    • (1992) IEEE Trans. Electron Devices , vol.39 , Issue.2 , pp. 331-338
    • Hurkx, G.1    Klaassen, D.2    Knuvers, M.3
  • 46
    • 75549089115 scopus 로고    scopus 로고
    • Drain leakage mechanisms in fully depleted SOI devices with undoped channel MOSFETs
    • Sep.
    • R. Luyken, "Drain leakage mechanisms in fully depleted SOI devices with undoped channel MOSFETs," in Proc. 33rd ESSDERC, Sep. 2003, pp. 419-422.
    • (2003) Proc. 33rd ESSDERC , pp. 419-422
    • Luyken, R.1
  • 47
    • 0142217024 scopus 로고    scopus 로고
    • Impact ionization and band-to-band tunneling in ultrathin body SOI devices with undoped channels
    • Sep.
    • R. Luyken, "Impact ionization and band-to-band tunneling in ultrathin body SOI devices with undoped channels," in Proc. IEEE Int. SOI Conf., Sep. 2003, pp. 166-167.
    • (2003) Proc. IEEE Int. SOI Conf. , pp. 166-167
    • Luyken, R.1
  • 48
    • 42549117204 scopus 로고    scopus 로고
    • Band to band tunneling limited off state current in ultrathin body double gate FETs with high mobility materials: III-V, Ge and strained Si/Ge
    • Sep.
    • D. Kim, T. Krishnamohan, Y. Nishi, and K. Saraswat, "Band to band tunneling limited off state current in ultrathin body double gate FETs with high mobility materials: III-V, Ge and strained Si/Ge," in Proc. Int. Conf. Simul. Semicond. Process. Devices, Sep. 2006, pp. 389-392.
    • (2006) Proc. Int. Conf. Simul. Semicond. Process. Devices , pp. 389-392
    • Kim, D.1    Krishnamohan, T.2    Nishi, Y.3    Saraswat, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.