메뉴 건너뛰기




Volumn 52, Issue 6, 2005, Pages 1132-1140

Analysis of the parasitic S/D resistance in multiple-gate FETs

Author keywords

(110) transport; Analytical model; Fin field effect transistors (FinFETs); Fully depleted; Series resistance; Silicon epitaxy; Silicon on insulator (SOI) MOSFET; Small geometry; Source drain (S D)

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; GATES (TRANSISTOR); MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SILICON ON INSULATOR TECHNOLOGY;

EID: 21044449128     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.848098     Document Type: Article
Times cited : (352)

References (27)
  • 2
    • 0035445204 scopus 로고    scopus 로고
    • "A study of the threshold voltage variation for ultra-small bulk and SOI CMOS"
    • Sep
    • K. Takeuchi, R. Koh, and T. Mogami, "A study of the threshold voltage variation for ultra-small bulk and SOI CMOS," IEEE Trans. Electron. Devices, vol. 48, no. 9, pp. 1995-2001, Sep. 2001.
    • (2001) IEEE Trans. Electron. Devices , vol.48 , Issue.9 , pp. 1995-2001
    • Takeuchi, K.1    Koh, R.2    Mogami, T.3
  • 3
    • 0141940117 scopus 로고    scopus 로고
    • "Scaling fully depleted SOI CMOS"
    • Oct
    • V. P. Trivedi and J. G. Fossum, "Scaling fully depleted SOI CMOS," IEEE Trans. Electron. Devices, vol. 50, no. 10, pp. 2095-2103, Oct. 2003.
    • (2003) IEEE Trans. Electron. Devices , vol.50 , Issue.10 , pp. 2095-2103
    • Trivedi, V.P.1    Fossum, J.G.2
  • 4
    • 6344290643 scopus 로고
    • "Calculated threshold-voltage characteristics of an XMOS transistor having an additional bottom gate"
    • T. Sekigawa and Y. Hayashi, "Calculated threshold-voltage characteristics of an XMOS transistor having an additional bottom gate," Solid State Electron., vol. 27, pp. 827-828, 1984.
    • (1984) Solid State Electron. , vol.27 , pp. 827-828
    • Sekigawa, T.1    Hayashi, Y.2
  • 9
    • 1842582446 scopus 로고    scopus 로고
    • "A self-aligned gate-all-around MOS transistor on single-grain silicon"
    • S. Zhang, R. Han, H. Wang, and M. Chan, "A self-aligned gate-all-around MOS transistor on single-grain silicon," Electrochem. Solid-State Lett., vol. 7, no. 4, pp. G59-G61, 2004.
    • (2004) Electrochem. Solid-State Lett. , vol.7 , Issue.4
    • Zhang, S.1    Han, R.2    Wang, H.3    Chan, M.4
  • 13
    • 0036051390 scopus 로고    scopus 로고
    • "MOSFET scalability limits and 'new frontier' devices"
    • D. A. Antoniadis, "MOSFET scalability limits and 'new frontier' devices," in Symp. VLSI Tech. Dig., 2002, pp. 2-5.
    • (2002) Symp. VLSI Tech. Dig. , pp. 2-5
    • Antoniadis, D.A.1
  • 15
    • 0034452659 scopus 로고    scopus 로고
    • "Advanced model and analysis for series resistance in sub-100 nm CMOS including poly depletion and overlap doping gradient effect"
    • S. D. Kim, C.-M. Park, and J. C. S. Woo, "Advanced model and analysis for series resistance in sub-100 nm CMOS including poly depletion and overlap doping gradient effect," in IEDM Tech. Dig., 2000, pp. 723-726.
    • (2000) IEDM Tech. Dig. , pp. 723-726
    • Kim, S.D.1    Park, C.-M.2    Woo, J.C.S.3
  • 17
    • 0004123519 scopus 로고    scopus 로고
    • ISE-TCAD
    • User's Manual, ISE-TCAD, 2004.
    • (2004) User's Manual
  • 19
    • 0020707455 scopus 로고
    • "Spreading resistance in submicron MOSFETs"
    • G. Baccarani and G. A. Sai-Halasz, "Spreading resistance in submicron MOSFETs," IEEE Electron Device Lett., vol. 4, no. 2, pp. 27-29, 1983.
    • (1983) IEEE Electron Device Lett. , vol.4 , Issue.2 , pp. 27-29
    • Baccarani, G.1    Sai-Halasz, G.A.2
  • 20
    • 0014628504 scopus 로고
    • "Contact resistance on diffused resistors"
    • H. H. Berger, "Contact resistance on diffused resistors," in Proc. ISSCC, 1969, pp. 162-163.
    • (1969) Proc. ISSCC , pp. 162-163
    • Berger, H.H.1
  • 21
    • 0036494619 scopus 로고    scopus 로고
    • "Advanced model and analysis of series resistance for CMOS scaling into nanometer regime - Part I: Theoretical derivation"
    • Mar
    • S.-D. Kim, C.-M. Park, and J. C. S. Woo, "Advanced model and analysis of series resistance for CMOS scaling into nanometer regime - Part I: Theoretical derivation," IEEE Trans. Electron. Devices, vol. 49, no. 3, pp. 457-466, Mar. 2002.
    • (2002) IEEE Trans. Electron. Devices , vol.49 , Issue.3 , pp. 457-466
    • Kim, S.-D.1    Park, C.-M.2    Woo, J.C.S.3
  • 25
    • 17444426457 scopus 로고    scopus 로고
    • "Impact of source-drain doping profiles and contact schemes on FinFET performance in the nanoscale regime"
    • H. Kam, L. Chang, and T.-J. King, "Impact of source-drain doping profiles and contact schemes on FinFET performance in the nanoscale regime," in Proc. IEEE Silicon Nanoelectronics Workshop, 2004, pp. 9-10.
    • (2004) Proc. IEEE Silicon Nanoelectronics Workshop , pp. 9-10
    • Kam, H.1    Chang, L.2    King, T.-J.3
  • 26
    • 0141987497 scopus 로고    scopus 로고
    • "Current crowding effect on thermal characteristics of Ni/doped-Si contacts"
    • Oct
    • C.-N. Liao and K.-C. Chen, "Current crowding effect on thermal characteristics of Ni/doped-Si contacts," IEEE Electron Device Lett., vol. 24, no. 10, pp. 637-639, Oct. 2003.
    • (2003) IEEE Electron Device Lett. , vol.24 , Issue.10 , pp. 637-639
    • Liao, C.-N.1    Chen, K.-C.2
  • 27
    • 0036540925 scopus 로고    scopus 로고
    • "Mapping nanometer-scale temperature gradients in patterned cobalt-nickel silicide films"
    • M. Cannaerts, O. Chamirian, K. Maex, and C. V. Haesendonck, "Mapping nanometer-scale temperature gradients in patterned cobalt-nickel silicide films," Nanotechnology, vol. 13, pp. 149-152, 2002.
    • (2002) Nanotechnology , vol.13 , pp. 149-152
    • Cannaerts, M.1    Chamirian, O.2    Maex, K.3    Haesendonck, C.V.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.