-
1
-
-
42549121969
-
High mobility, low band-to-band-tunneling (BTBT), double gate heterostruoture FETs : Simulations
-
T. Krishnamohan, D. Kim, C. Nguyen, C. Jungemann, Y. Nishi, K. Saraswat, "High mobility, low band-to-band-tunneling (BTBT), double gate heterostruoture FETs : simulations", IEEE Transactions Electron Devices (TED) Special Issue on 'Non-classical Si CMOS devices and technologies extending the roadmap', pp. 990, 2006
-
(2006)
IEEE Transactions Electron Devices (TED) Special Issue on 'Non-classical Si CMOS devices and technologies extending the roadmap
, pp. 990
-
-
Krishnamohan, T.1
Kim, D.2
Nguyen, C.3
Jungemann, C.4
Nishi, Y.5
Saraswat, K.6
-
2
-
-
33745138556
-
Low defect ultra-thin fully strained-Ge MOSFET on relaxed Si with high mobility and low band-to-band-tunneling (BTBT)
-
T. Krishnamohan, Z. Krivokapic, K. Uchida, Y. Nishi, K.C. Saraswat, "Low defect ultra-thin fully strained-Ge MOSFET on relaxed Si with high mobility and low band-to-band-tunneling (BTBT)" Symposium on VLSI Technology, pp. 82-83, 2005.
-
(2005)
Symposium on VLSI Technology
, pp. 82-83
-
-
Krishnamohan, T.1
Krivokapic, Z.2
Uchida, K.3
Nishi, Y.4
Saraswat, K.C.5
-
3
-
-
41149149758
-
Strained-Si, Relaxed-Ge or strained-SiGe for Future Nanoscale PMOSFETs
-
T. Krishnamohan, D. Kim, C. Jungemann. Y. Nishi. K.Saraswat, "Strained-Si, Relaxed-Ge or strained-SiGe for Future Nanoscale PMOSFETs", IEEE Symposium on VLSI Technology, 2006.
-
(2006)
IEEE Symposium on VLSI Technology
-
-
Krishnamohan, T.1
Kim, D.2
Jungemann, C.3
Nishi, Y.4
Saraswat, K.5
-
4
-
-
33846065345
-
Investigation of Performance limits of III-V double-gate NMOSFETs
-
IEDM, pp
-
A. Pethe, T. Krishnamohan, D. Kim, S. Oh, P. Wong, K. Saraswat, "Investigation of Performance limits of III-V double-gate NMOSFETs", IEEE International Eleotron Devices Meeting (IEDM), pp. 605-608, 2005.
-
(2005)
IEEE International Eleotron Devices Meeting
, pp. 605-608
-
-
Pethe, A.1
Krishnamohan, T.2
Kim, D.3
Oh, S.4
Wong, P.5
Saraswat, K.6
-
6
-
-
0001038893
-
Band structure, deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys
-
M.V. Fischetti, S.E. Laux, "Band structure, deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys", Journal of Applied Physics, pp. 2234-2252, 1996.
-
(1996)
Journal of Applied Physics
, pp. 2234-2252
-
-
Fischetti, M.V.1
Laux, S.E.2
-
7
-
-
0026116329
-
Monte Carlo Simulation of Transport in Technologically Significant Semiconductors of the Diamond and Zinc-Blende Structures - Part I: Homogeneous Transport
-
March
-
M.V. Fischetti, "Monte Carlo Simulation of Transport in Technologically Significant Semiconductors of the Diamond and Zinc-Blende Structures - Part I: Homogeneous Transport", IEEE Transactions on Electron Devices, vol. 38, No. 3, pp. 634-649, March 1991.
-
(1991)
IEEE Transactions on Electron Devices
, vol.38
, Issue.3
, pp. 634-649
-
-
Fischetti, M.V.1
-
8
-
-
42549141527
-
-
MINIMOS™
-
MINIMOS™
-
-
-
-
9
-
-
42549116514
-
-
TAURUS™
-
TAURUS™
-
-
-
-
10
-
-
42549086107
-
-
DESSIS™
-
DESSIS™
-
-
-
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