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Volumn 19, Issue 4, 1998, Pages 134-136

Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CMOS INTEGRATED CIRCUITS; COMPOSITION EFFECTS; COMPUTER SIMULATION; ELECTRON TUNNELING; GATES (TRANSISTOR); LEAKAGE CURRENTS; SEMICONDUCTOR DOPING;

EID: 0032049972     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.663538     Document Type: Article
Times cited : (26)

References (6)
  • 1
    • 0028462004 scopus 로고
    • Scaling of MOS technology to submicrometer feature sizes
    • C. A. Mead, "Scaling of MOS technology to submicrometer feature sizes," J. VLSI Signal Processing, vol. 8, pp. 9-25, 1994.
    • (1994) J. VLSI Signal Processing , vol.8 , pp. 9-25
    • Mead, C.A.1
  • 4
    • 0023553867 scopus 로고
    • Corner-field induced drain leakage in thin oxide MOSFET's
    • C. Chang and J. Lien, "Corner-field induced drain leakage in thin oxide MOSFET's," in IEDM Tech. Dig., 1987. pp. 714-717.
    • (1987) IEDM Tech. Dig. , pp. 714-717
    • Chang, C.1    Lien, J.2
  • 5
    • 0023542548 scopus 로고
    • The impact of gate-induced drain leakage current on MOSFET scaling
    • T. Y. Chan, J. Chen, P. K. Ko, and C. Hu, "The impact of gate-induced drain leakage current on MOSFET scaling," in IEDM Tech. Dig., 1987, pp. 718-721.
    • (1987) IEDM Tech. Dig. , pp. 718-721
    • Chan, T.Y.1    Chen, J.2    Ko, P.K.3    Hu, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.