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Volumn 573, Issue 2, 2004, Pages 291-309

Quantitative study of oxygen enhancement of sputtered ion yields. I. Argon ion bombardment of a silicon surface with O2 flood

Author keywords

Ion bombardment; Ion implantation; Oxidation; Oxygen; Secondary ion mass spectroscopy; Silicon; Sputtering

Indexed keywords

ION BOMBARDMENT; ION IMPLANTATION; OXIDATION; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; THIN FILMS;

EID: 10044277163     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.10.001     Document Type: Article
Times cited : (51)

References (71)
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    • Ion implantation was made by Leonard Kroko Inc., Tustin, California
    • Ion implantation was made by Leonard Kroko Inc., Tustin, California.
  • 39
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    • The reference standard was provided by C.W. Magee; p. 3.2-7 in Ref. [2]
    • The reference standard was provided by C.W. Magee; p. 3.2-7 in Ref. [2].
  • 40
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    • (1997) Secondary Ion Mass Spectrometry SIMS , vol.10 , pp. 203
    • Tian, C.1    Elst, K.2    Vandervorst, W.3    Maex, K.4
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    • personal communication
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    • (2004)
    • Wee, A.T.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.