Use of C60 cluster projectiles for sputter depth profiling of polycrystalline metals

Surface and Interface Analysis

Volumn 36, Issue 10, 2004, Pages 1367-1372

  Sun, S ^a   Szakal, C ^a   Roll, T ^b   Mazarov, P ^b   Wucher, A ^b   Winograd, N ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ION BOMBARDMENT; KINETIC ENERGY; METALLIZING; METALS; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC PROJECTILES; ERODED CRATERS; ION ENERGY; PROFILE ANALYSIS;

POLYCRYSTALLINE MATERIALS;

EID: 6344276797     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1923     Document Type: Article

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