In situ deposition of neutral Cs for Secondary Ion Mass Spectrometry

Applied Surface Science

Volumn 222, Issue 1-4, 2004, Pages 186-197

  Wirtz, T ^a   Migeon, H N ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

Author keywords

Cesium concentration; Cesium deposition; Cesium evaporator; Quantification; Secondary Ion Mass Spectrometry; Sputtering

Indexed keywords

CONCENTRATION (PROCESS); DEGREES OF FREEDOM (MECHANICS); ELECTRON TUNNELING; EROSION; EVAPORATION; EVAPORATORS; HEATING; IN SITU PROCESSING; INTERFACIAL ENERGY; ION BOMBARDMENT; IONIZATION; MASS SPECTROMETERS; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; SURFACE PHENOMENA;

DEPOSITION RATES; HEATING POWER; MATRIX EFFECTS; NEUTRAL ATOMS;

CESIUM;

EID: 0348014450     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.08.020     Document Type: Article

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