Observation of sputtered Si surface irradiated with metal cluster complex ions

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5528-5530

  Teranishi, Yoshikazu ^a   Kondou, Kouji ^a   Fujiwara, Yukio ^a   Nonaka, Hidehiko ^a   Tomita, Misuhiro ^b   Yamamoto, Kazuhiro ^a   Fujimoto, Toshiyuki ^a   Ichimura, Shingo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

AFM; Ion cluster; Roughness; Sputter

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SURFACE ROUGHNESS;

ACCELERATION ENERGY; ION CLUSTERS; LOW-DAMAGE SPUTTERING SOURCE;

SEMICONDUCTING SILICON;

EID: 33745650482     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5528     Document Type: Review

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