Substrate biasing effects on the microstructure of magnetron-sputtered AlN films investigated by in situ reflectance interferometry

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3957-3964

  Pigeat, P ^a   Easwarakhanthan, T ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Aluminium nitride; Ellipsometry; Magnetron sputtering; Microstructure; Optical properties; Reflectance interferometry; Thin films

Indexed keywords

ALUMINUM COMPOUNDS; ELLIPSOMETRY; MAGNETRON SPUTTERING; MICROSTRUCTURE; THIN FILMS;

ALUMINUM NITRIDE; REFLECTANCE INTERFEROMETRY;

METALLIC FILMS;

EID: 40749110539     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.214     Document Type: Article

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