Process monitoring and control of low temperature reactively sputtered A1N

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 16-20

  Kirkpatrick, Scott R ^a   Rohde, Suzanne L ^a   Mihut, Dorina M ^a   Kurruppu, Mary L ^a   Swanson III, John R ^a   Thomson, Dan ^a   Woollam, John A ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

Ellipsometry; Low temperature reactively sputtered A1N; Target voltage analysis

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; CRYSTAL ORIENTATION; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; NITRIDES; PROCESS CONTROL; REFRACTIVE INDEX; SILICON; SPUTTER DEPOSITION; STAINLESS STEEL;

ALUMINUM NITRIDE; LOW TEMPERATURE REACTIVE SPUTTERING;

OPTICAL FILMS;

EID: 0032476231     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01020-7     Document Type: Article

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