The evolution of preferred orientation and morphology of AlN films under various RF sputtering powers

Surface and Coatings Technology

Volumn 167, Issue 2-3, 2003, Pages 297-301

  Cheng, Hao ^a   Hing, Peter ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

AlN film; Morphology; Preferred orientation; RF sputtering; Roughness

Indexed keywords

ALUMINUM NITRIDE; MIXTURES; SCANNING ELECTRON MICROSCOPY; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

REACTIVE SPUTTERING;

METALLIC FILMS;

ALUMINUM NITRIDE; COATING; CRYSTALLIZATION; SPUTTERING;

EID: 0037461188     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00923-4     Document Type: Article

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