Optical and thermal characterization of AlN thin films deposited by pulsed laser deposition

Applied Surface Science

Volumn 186, Issue 1-4, 2002, Pages 507-512

  Jacquot, A ^a   Lenoir, B ^a   Dauscher, A ^a   Verardi, P ^b   Craciun, F ^b   Stolzer M ^c   Gartner, M ^d   Dinescu, M ^e  

^a CNRS   (France)

^b CNR Consiglio Nazionale delle Ricerche   (Italy)

^c MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^d INSTITUTE OF PHYSICAL CHEMISTRY   (Romania)

^e NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

3 method; AlN; Pulsed laser deposition; Refractive index; Thermal conductivity

Indexed keywords

ALUMINUM NITRIDE; FILM GROWTH; INFRARED SPECTROSCOPY; NEODYMIUM LASERS; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SUBSTRATES; THERMAL CONDUCTIVITY;

LASER CHEMICAL VAPOR DEPOSITION (LCVD);

THIN FILMS;

EID: 0037185175     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00767-X     Document Type: Conference Paper

References (29)