Optical models for radio-frequency-magnetron reactively sputtered AlN films

Journal of Applied Physics

Volumn 98, Issue 7, 2005, Pages

  Easwarakhanthan, T ^a   Assouar, M B ^a   Pigeat, P ^a   Alnot, P ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

RADIO-FREQUENCY (RF) MAGNETRON; SPECTROSCOPIC ELLIPSOMETRY (SE); WAVELENGTH;

ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPY; ELLIPSOMETRY; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SILICON; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE;

EID: 27144466021     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2076444     Document Type: Article

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