SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 8, 2006, Pages 2764-2768

Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering

(7) Mahieu, Stijn a Ghekiere, P a De Winter, G a De Gryse, R a Depla, D a Van Tendeloo, G b Lebedev, O I b

a GHENT UNIVERSITY (Belgium)

b UNIVERSITY OF ANTWERP (Belgium)

Author keywords

Direct current; Grain growth; Growth models; Magnetron; Reactive sputtering; Titanium nitride

Indexed keywords

GRAIN GROWTH; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; SUBSTRATES; TEXTURES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

BIAXIAL ALIGNMENT; DIRECT CURRENT; GROWTH MODELS; REACTIVE SPUTTERING;

TITANIUM NITRIDE;

COATING; TITANIUM NITRIDE;

EID: 30644463004 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.09.012 Document Type: Article

Times cited : (50)

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