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Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 98-105

Initial growth phase of diamond thin films observed by thermal emission spectrometry

(5) Barrat, S a Pigeat, P a Dieguez, I a Bauer Grosse, E a Weber, B a

a UNIVERSITÉ DE LORRAINE (France)

Author keywords

Chemical vapour deposition (CVD); Diamond; Growth mechanism; Optical spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; FILM GROWTH; INTERFEROMETRY; NUCLEATION; PLASMA APPLICATIONS; SPECTROMETRY; THIN FILMS;

MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (MPCVD); PYROMETRIC INTERFEROMETRY; THERMAL EMISSION SPECTROMETRY;

DIAMOND FILMS;

EID: 0031191097 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00171-5 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.