Fast (tens to hundreds of eV) neutral beams for materials processing

Journal of Physics D: Applied Physics

Volumn 41, Issue 2, 2008, Pages

  Economou, Demetre J ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR DISTRIBUTION; MATERIALS SCIENCE; PLASMA APPLICATIONS; REACTIVE ION ETCHING; THIN FILMS;

BEAM ENERGY; MATERIALS PROCESSING; NEUTRAL BEAM GENERATION; NEUTRAL BEAMS;

PARTICLE BEAMS;

EID: 38049050733     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/2/024001     Document Type: Article

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