Pulsed plasma processing for reduction of profile distortion induced by charge buildup in electron cyclotron resonance plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 4 SUPPL. B, 1996, Pages 2450-2455

  Fujiwara, Nobuo ^a   Maruyama, Takahiro ^a   Yoneda, Masahiro ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Charge buildup; Electron cyclotron resonance; Electron temperature; Ion sheath; Microwave plasma; Plasma etching

Indexed keywords

ELECTRIC CHARGE; ELECTROMAGNETIC WAVE ATTENUATION; ELECTRON CYCLOTRON RESONANCE; ELECTRONS; EMISSION SPECTROSCOPY; IONS; LASER PULSES; LIGHT EMISSION; MODELS; PLASMAS; PROTONS; PULSE MODULATION;

AMBIPOLAR DIFFUSION; ASPECT RATIO DEPENDENCE; CHARGE BUILDUP; ELECTRON CYCLOTRON RESONANCE PLASMA; NOTCH DEPTH REDUCTION; OFF TIME LENGTH; PROFILE DISTORTION REDUCTION; PULSED PLASMA PROCESSING;

PLASMA ETCHING;

EID: 0030125045     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2450     Document Type: Article

References (9)

1. T. Morimoto, C. Takahashi and S. Matsuo: Proc. 13th Symp. Dry Process (The Institute of Electrical Engineers Japan, tokyo, 1991) p. 57.
2. M. Toyota, H. Sekiya, T. Ejima, N. Fujiwara, H. Ootera and T. Oomori: Ext. Abstr. 39th Spring Meet. Japan Society of Applied Physics and Related Societies, Chiba, 1992, 29a-NC-6 [in Japanese].
3. T. Nozawa, T. Kinosita, T. Nishizuka and A. Nakaue: Proc. Symp. Highly Selective Dry Etching and Damage Control, eds. G. S. Mathad and Y. Horiike (Electrochemical Society, Pennington, 1993) p. 134.
4. N. Fujiwara, T. Maruyama, M. Yoneda, K. Tsukamoto and T. Banjo: Jpn. J. Appl. Phys. 33 (1994) 2164.
5. S. Samukawa and K. Terada: Dig. of Tech. Pap. 1994 Symp. VLSI Technology (1994) p. 27.
6. S. G. Ingram: J. Appl. Phys. 68 (1990) 500.
7. M. Yoneda, T. Maruyama and N. Fujiwara: J. Vac. Sci. & Technol. B12 (1994) 3363.
8. N. Fujiwara, T. Maruyama and M. Yoneda: Jpn. J. Appl. Phys. 34 (1995) 2095.
9. N. Fujiwara, H. Sawai, M. Yoneda, K. Nishioka, K. Horie, K. Nakamoto and H. Abe: Jpn. J. Appl. Phys. 30 (1991) 3142.