Ion beam aperture-array lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2529-2532

  Ruchhoeft, Paul ^a   Wolfe, J C ^a   Bass, Robert ^b  

^a University of Houston   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IONS; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; OPTIMIZATION;

DOSE COMPENSATION; ION BEAM APERTURE ARRAY LITHOGRAPHY; STENCIL MASK;

ION BEAM LITHOGRAPHY;

EID: 0035519469     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420578     Document Type: Article

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