Atomic fluorine beam etching of silicon and related materials

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 307-312

  Larson, P R ^a   Copeland, K A ^a   Dharmasena, G ^a   Lasell, R A ^a   Keil, M ^a   Johnson, M B ^a  

^a UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DISSOCIATION; ETCHING; FLUORINE; MASKS; NANOTECHNOLOGY; SILICA; SILICON NITRIDE; VACUUM APPLICATIONS;

ARRHENIUS PLOT; ATOMIC FLUORINE BEAM ETCHING; ETCH SELECTIVITY;

SEMICONDUCTING SILICON;

EID: 0033725630     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591190     Document Type: Article

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