Atomic nanofabrication: Atomic deposition and lithography by laser and magnetic forces

Journal of Physics D: Applied Physics

Volumn 36, Issue 3, 2003, Pages

  Meschede, D ^a   Metcalf, H ^a,b  

^a INSTITUT FÜR ANGEWANDTE PHYSIK   (Germany)

^b STONY BROOK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ATOMIC BEAMS; ATOMIC FORCE MICROSCOPY; DEPOSITION; LASER BEAM EFFECTS; MAGNETIC FIELD EFFECTS; NANOTECHNOLOGY; NUMERICAL ANALYSIS; REFRACTIVE INDEX;

ATOMIC DEPOSITION; ATOMIC NANOFABRICATION; GRADED INDEX; NEUTRAL ATOM LITHOGRAPHY;

SURFACES;

EID: 0037423452     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/3/202     Document Type: Review

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