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Volumn 77, Issue 3, 2006, Pages
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Investigation of a rf inductively coupled plasma ion source capable of highly uniform and collimated ion-beam generation
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
DIAMETER WAFER;
DIVERGENCE ANGLE;
HIGH DIRECTIONALITY;
PLASMA DENSITY DISTRIBUTION;
PLASMA GENERATOR;
RADIAL PLASMA DENSITY UNIFORMITY;
RF ION SOURCE;
STATIC ETCH UNIFORMITY;
ION BEAMS;
MAGNETIC FIELDS;
MAGNETIC HEADS;
PLASMAS;
SENSORS;
ION SOURCES;
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EID: 33645828220
PISSN: 00346748
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2172349 Document Type: Article |
Times cited : (5)
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References (19)
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