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Volumn 77, Issue 3, 2006, Pages

Investigation of a rf inductively coupled plasma ion source capable of highly uniform and collimated ion-beam generation

Author keywords

[No Author keywords available]

Indexed keywords

DIAMETER WAFER; DIVERGENCE ANGLE; HIGH DIRECTIONALITY; PLASMA DENSITY DISTRIBUTION; PLASMA GENERATOR; RADIAL PLASMA DENSITY UNIFORMITY; RF ION SOURCE; STATIC ETCH UNIFORMITY;

EID: 33645828220     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2172349     Document Type: Article
Times cited : (5)

References (19)
  • 4
    • 0003638740 scopus 로고
    • edited by O. A.Popov (Noyes, Oceanville, NJ
    • High Density Plasma Sources, edited by, O. A. Popov, (Noyes, Oceanville, NJ, 1995).
    • (1995) High Density Plasma Sources


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.