Localization of metastable atom beams with optical standing waves: Nanolithography at the Heisenberg limit

Science

Volumn 280, Issue 5369, 1998, Pages 1583-1586

  Johnson, K S ^a,b   Thywissen, J H ^a   Dekker, N H ^a   Berggren, K K ^a,c   Chu, A P ^a,d   Younkin, R ^a   Prentiss, M ^a  

^a HARVARD UNIVERSITY   (United States)

^b IGEN Inc   (United States)

^c MIT LINCOLN LABORATORY   (United States)

^d LEHMAN BROTHERS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBONIC ACID; HYDROCARBON; NANOPARTICLE; SILICON; SILICON DIOXIDE;

ARTICLE; ATOMIC PARTICLE; OPTICS; PRIORITY JOURNAL; QUANTUM MECHANICS; STEADY STATE; SYSTEM ANALYSIS; VAPOR;

EID: 0032486183     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.280.5369.1583     Document Type: Article

References (31)

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31. Supported in part by NSF grant PHY 9312572. This work made use of the Harvard-Materials Research Science and Engineering Center (NSF) shared facilities. K.S.J. was supported by an AT&T/Lucent Technologies Graduate Fellowship. J.H.T. was supported by the Fannie and John Hertz Foundation.