-
1
-
-
0003666038
-
-
S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Eds.; Park Ridge, NJ: Noyes
-
S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Eds., Handbook of Plasma Processing Technology. Park Ridge, NJ: Noyes, 1990.
-
(1990)
Handbook of Plasma Processing Technology
-
-
-
3
-
-
0033735086
-
Modeling and simulation of plasma etching reactors for microelectronics
-
D. J. Economou, "Modeling and simulation of plasma etching reactors for microelectronics," Thin Solid Films, vol. 365, pp. 348-367, 2000.
-
(2000)
Thin Solid Films
, vol.365
, pp. 348-367
-
-
Economou, D.J.1
-
4
-
-
0001290374
-
Dynamics of collisionless rf plasma sheaths
-
P. A. Miller and M. E. Riley, "Dynamics of collisionless rf plasma sheaths," J. Appl. Phys., vol. 82, pp. 3689-3709, 1997.
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 3689-3709
-
-
Miller, P.A.1
Riley, M.E.2
-
5
-
-
0032654285
-
Ion energy distributions in rf sheaths; review, analysis and simulation
-
E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, "Ion energy distributions in rf sheaths; review, analysis and simulation," Plasma Sources Sci. Technol., vol. 8, pp. R45-R64, 1999.
-
(1999)
Plasma Sources Sci. Technol.
, vol.8
-
-
Kawamura, E.1
Vahedi, V.2
Lieberman, M.A.3
Birdsall, C.K.4
-
6
-
-
36549099421
-
Distribution of ion energies incident on electrodes in capacitively coupled rf discharges
-
M. J. Kushner, "Distribution of ion energies incident on electrodes in capacitively coupled rf discharges," J. Appl. Phys., vol. 58, pp. 4024-4031, 1985.
-
(1985)
J. Appl. Phys.
, vol.58
, pp. 4024-4031
-
-
Kushner, M.J.1
-
7
-
-
36549092475
-
Monte Carlo simulation of ion transport through rf glow-discharge sheaths
-
B. E. Thomson, H. H. Sawin, and D. A. Fisher, "Monte Carlo simulation of ion transport through rf glow-discharge sheaths," J. Appl. Phys., vol. 63, pp. 2241-2251, 1988.
-
(1988)
J. Appl. Phys.
, vol.63
, pp. 2241-2251
-
-
Thomson, B.E.1
Sawin, H.H.2
Fisher, D.A.3
-
8
-
-
0026139803
-
Ion kinetics in low-pressure, electropositive, rf glow discharge sheaths
-
Jan.
-
M. S. Barnes, J. C. Forster, and J. H, Keller, "Ion kinetics in low-pressure, electropositive, rf glow discharge sheaths," IEEE Trans. Plasma Sci., vol. 19, pp. 240-244, Jan. 1991.
-
(1991)
IEEE Trans. Plasma Sci.
, vol.19
, pp. 240-244
-
-
Barnes, M.S.1
Forster, J.C.2
Keller, J.H.3
-
9
-
-
0000823657
-
Ion bombardment energy distributions in a radio frequency induction plasma
-
J. Hopwood, "Ion bombardment energy distributions in a radio frequency induction plasma," Appl. Phys. Lett., vol. 62, pp. 940-942, 1993.
-
(1993)
Appl. Phys. Lett.
, vol.62
, pp. 940-942
-
-
Hopwood, J.1
-
10
-
-
0000800464
-
Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor
-
M. A. Sobolewski, J. K. Olthoff, and Y. Wang "Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor," J. Appl. Phys., vol. 85, pp. 3966-3975, 1999.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 3966-3975
-
-
Sobolewski, M.A.1
Olthoff, J.K.2
Wang, Y.3
-
11
-
-
0033445241
-
Energy distribution of ions bombarding biased electrodes in high density plasma rectors
-
E. K. Edelberg, A. Perry, N. Benjamin, and E. S. Aydil, "Energy distribution of ions bombarding biased electrodes in high density plasma rectors," J. Vac. Sci. Technol. A, vol. 17, pp. 506-516, 1999.
-
(1999)
J. Vac. Sci. Technol. A
, vol.17
, pp. 506-516
-
-
Edelberg, E.K.1
Perry, A.2
Benjamin, N.3
Aydil, E.S.4
-
12
-
-
0001704693
-
Ion energy and angular distributions in inductively driven discharges in chlorine
-
J. R. Woodworth, M. E. Riley, P. A. Miller, G. A. Hebner, and T. W. Hamilton, "Ion energy and angular distributions in inductively driven discharges in chlorine," J. Appl. Phys., vol. 81, pp. 5950-5959, 1997.
-
(1997)
J. Appl. Phys.
, vol.81
, pp. 5950-5959
-
-
Woodworth, J.R.1
Riley, M.E.2
Miller, P.A.3
Hebner, G.A.4
Hamilton, T.W.5
-
13
-
-
0001041427
-
Reactive ion etching for microelectrical mechanical system fabrication
-
I. W. Rangelow and H. Loschner, "Reactive ion etching for microelectrical mechanical system fabrication," J. Vac. Sci. Technol. B, vol. 13, pp. 2394-2399, 1995.
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 2394-2399
-
-
Rangelow, I.W.1
Loschner, H.2
-
14
-
-
0032652092
-
Plasma sheath electric field strengths above a grooved electrodes in a parallel plate radio-frequency discharge
-
Feb.
-
U. Czarnetzki, G. A. Hebner, D. Luggenholscher, H. F. Dobele, and M. E. Riley, "Plasma sheath electric field strengths above a grooved electrodes in a parallel plate radio-frequency discharge," IEEE Trans. Plasma Sci., vol. 27, pp. 70-71, Feb. 1999.
-
(1999)
IEEE Trans. Plasma Sci.
, vol.27
, pp. 70-71
-
-
Czarnetzki, U.1
Hebner, G.A.2
Luggenholscher, D.3
Dobele, H.F.4
Riley, M.E.5
-
15
-
-
0036477413
-
Plasma molding over surface topography
-
D. Kim and D. J. Economou, "Plasma molding over surface topography," JSME Int. J., B, vol. 45, pp. 117-122, 2002.
-
(2002)
JSME Int. J., B
, vol.45
, pp. 117-122
-
-
Kim, D.1
Economou, D.J.2
-
16
-
-
0035271893
-
Anisotropic etching of polymer films by high energy (∼ 100s of eV) oxygen atom neutral beams
-
S. Panda, D. J. Economou, and L. Chen, "Anisotropic etching of polymer films by high energy (∼ 100s of eV) oxygen atom neutral beams," J. Vac. Sci. Technol. A, vol. 19, pp. 398-404, 2001.
-
(2001)
J. Vac. Sci. Technol. A
, vol.19
, pp. 398-404
-
-
Panda, S.1
Economou, D.J.2
Chen, L.3
-
18
-
-
0001675382
-
Two-dimensional fluid modeling of time-dependent plasma sheath
-
M. Hong and G. A. Emmert, "Two-dimensional fluid modeling of time-dependent plasma sheath," J. Vac. Sci. Technol. B, vol. 12, pp. 889-896, 1994.
-
(1994)
J. Vac. Sci. Technol. B
, vol.12
, pp. 889-896
-
-
Hong, M.1
Emmert, G.A.2
-
19
-
-
0013536142
-
Flow: A two-dimensional time-dependent hydrodynamical ion extraction model
-
P. Vitello, C. Cerjan, and D. Braun, "Flow: A two-dimensional time-dependent hydrodynamical ion extraction model," Phys. Fluids B, vol. 4, pp. 1447-1456, 1992.
-
(1992)
Phys. Fluids B
, vol.4
, pp. 1447-1456
-
-
Vitello, P.1
Cerjan, C.2
Braun, D.3
-
21
-
-
33749583060
-
Flux-corrected transport. I. SHASTA, A fluid transport algorithm that works
-
J. P. Boris and D. L. Book, "Flux-corrected transport. I. SHASTA, A fluid transport algorithm that works," J. Comput. Phys., vol. 11, pp. 38-69, 1973.
-
(1973)
J. Comput. Phys.
, vol.11
, pp. 38-69
-
-
Boris, J.P.1
Book, D.L.2
-
22
-
-
3743101779
-
Fully multidimensional flux-corrected transport algorithm for fluids
-
S. T. Zalesak, "Fully multidimensional flux-corrected transport algorithm for fluids," J. Comput. Phys., vol. 31, pp. 335-362, 1979.
-
(1979)
J. Comput. Phys.
, vol.31
, pp. 335-362
-
-
Zalesak, S.T.1
-
23
-
-
36549103808
-
Two-dimensional studies of streamers in gases
-
S. K. Dhali and P. F. Williams, "Two-dimensional studies of streamers in gases," J. Appl. Phys., vol. 62, pp. 4696-4707, 1987.
-
(1987)
J. Appl. Phys.
, vol.62
, pp. 4696-4707
-
-
Dhali, S.K.1
Williams, P.F.2
-
24
-
-
0001668310
-
Solving the spatially dependent Boltzmann's equation for the electron-velocity distribution using flux corrected transport
-
J. V. DiCarlo and M. J. Kushner, "Solving the spatially dependent Boltzmann's equation for the electron-velocity distribution using flux corrected transport," J. Appl. Phys., vol. 66, pp. 5763-5774, 1989.
-
(1989)
J. Appl. Phys.
, vol.66
, pp. 5763-5774
-
-
DiCarlo, J.V.1
Kushner, M.J.2
-
25
-
-
0004161838
-
-
Cambridge, U.K.: Cambridge
-
W. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes in Fortran. Cambridge, U.K.: Cambridge, 1992.
-
(1992)
Numerical Recipes in Fortran
-
-
Press, W.H.1
Teukolsky, S.A.2
Vetterling, W.T.3
Flannery, B.P.4
-
26
-
-
36749114996
-
Kinetic theory of the plasma sheath transition in a weakly ionized plasma
-
K.-U. Riemann, "Kinetic theory of the plasma sheath transition in a weakly ionized plasma," Phys. Fluids, vol. 24, pp. 2163-2172, 1982.
-
(1982)
Phys. Fluids
, vol.24
, pp. 2163-2172
-
-
Riemann, K.-U.1
-
27
-
-
0026140546
-
Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC
-
Feb.
-
C. K. Birdsall, "Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC," IEEE Trans. Plasma Sci., vol. 19, pp. 65-85, Feb. 1991.
-
(1991)
IEEE Trans. Plasma Sci.
, vol.19
, pp. 65-85
-
-
Birdsall, C.K.1
-
28
-
-
0027242520
-
Low-energy ion scattering at surfaces
-
H. Niehus, W. Heiland, and E. Taglauer, "Low-energy ion scattering at surfaces," Surf. Sci. Report, vol. 17, pp. 213-303, 1993.
-
(1993)
Surf. Sci. Report
, vol.17
, pp. 213-303
-
-
Niehus, H.1
Heiland, W.2
Taglauer, E.3
-
29
-
-
0001524999
-
+ from Ni(111)
-
+ from Ni(111)," J. Chem. Phys., vol. 88, pp. 5902-5913, 1988.
-
(1988)
J. Chem. Phys.
, vol.88
, pp. 5902-5913
-
-
Kasi, S.R.1
Kilburn, M.A.2
Kang, H.3
Rabalais, J.W.4
Tavernini, L.5
Hochmann, P.6
-
30
-
-
0000191899
-
Gas-surface dynamics and profile evolution during etching of silicon
-
G. S. Hwang, C. M. Anderson, M. J. Gordon, T. A. Moore, T. K. Minton, and K. P. Giapis, "Gas-surface dynamics and profile evolution during etching of silicon," Phys. Rev. Lett., vol. 77, pp. 3049-3052, 1996.
-
(1996)
Phys. Rev. Lett.
, vol.77
, pp. 3049-3052
-
-
Hwang, G.S.1
Anderson, C.M.2
Gordon, M.J.3
Moore, T.A.4
Minton, T.K.5
Giapis, K.P.6
-
31
-
-
0032339301
-
+ impacts onto silicon surfaces: Distributions of reflected energies and angles
-
+ impacts onto silicon surfaces: Distributions of reflected energies and angles," J. Vac. Sci. Technol., vol. 16, pp. 3502-3514, 1998.
-
(1998)
J. Vac. Sci. Technol.
, vol.16
, pp. 3502-3514
-
-
Helmer, B.A.1
Graves, D.B.2
-
32
-
-
0027543823
-
Interactions of low energy (10-600 eV) noble gas ions with a graphite surface: Surface penetration, trapping and self-sputtering behaviors
-
W. Choi, C. Kim, and H. Kang, "Interactions of low energy (10-600 eV) noble gas ions with a graphite surface: Surface penetration, trapping and self-sputtering behaviors," Surf. Sci., vol. 281, pp. 323-335, 1993.
-
(1993)
Surf. Sci.
, vol.281
, pp. 323-335
-
-
Choi, W.1
Kim, C.2
Kang, H.3
-
33
-
-
0023995557
-
Effect of potential field on ion deflection and shape evolution of trenches during plasma-assisted etching
-
D. J. Economou and R. C. Alkire, "Effect of potential field on ion deflection and shape evolution of trenches during plasma-assisted etching," J. Electrochem. Soc., vol. 135, pp. 941-949, 1988.
-
(1988)
J. Electrochem. Soc.
, vol.135
, pp. 941-949
-
-
Economou, D.J.1
Alkire, R.C.2
-
34
-
-
0000302625
-
The influence of substrate topography on ion bombardment in plasma etching
-
S. G. Ingram, "The influence of substrate topography on ion bombardment in plasma etching," J. Appl. Phys., vol. 68, pp. 500-504, 1990.
-
(1990)
J. Appl. Phys.
, vol.68
, pp. 500-504
-
-
Ingram, S.G.1
-
35
-
-
0013499841
-
An experimental and theoretical study of ion distributions near 300-μm-tall-steps on rf-biased wafers in high density plasmas
-
to be published
-
J. R. Woodworth, P. A. Miller, R. J. Shul, I. C. Abraham, B. P. Aragon, T. W. Hamilton, C. G. Willison, D. Kim, and D. J. Economou, "An experimental and theoretical study of ion distributions near 300-μm-tall-steps on rf-biased wafers in high density plasmas," J. Vac. Sci. Technol., to be published.
-
J. Vac. Sci. Technol.
-
-
Woodworth, J.R.1
Miller, P.A.2
Shul, R.J.3
Abraham, I.C.4
Aragon, B.P.5
Hamilton, T.W.6
Willison, C.G.7
Kim, D.8
Economou, D.J.9
-
36
-
-
0001381888
-
An inductively coupled plasma source for the gaseous electronics conference RF reference cell
-
P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, "An inductively coupled plasma source for the gaseous electronics conference RF reference cell," J. Res. Natl. Inst. Stand. Technol., vol. 100, pp. 427-439, 1995.
-
(1995)
J. Res. Natl. Inst. Stand. Technol.
, vol.100
, pp. 427-439
-
-
Miller, P.A.1
Hebner, G.A.2
Greenberg, K.E.3
Pochan, P.D.4
Aragon, B.P.5
-
37
-
-
0001225044
-
Plasma sheath model and ion energy distribution for all radio frequencies
-
T. Panagopoulos and D. J. Economou, "Plasma sheath model and ion energy distribution for all radio frequencies," J. Appl. Phys., vol. 85, pp. 3435-3443, 1999.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 3435-3443
-
-
Panagopoulos, T.1
Economou, D.J.2
-
38
-
-
36549100883
-
The energy distribution of ions bombarding electrode surfaces in rf plasma reactors
-
A. Metze, D. W. Ernie, and H. J. Oskam, "The energy distribution of ions bombarding electrode surfaces in rf plasma reactors," J. Appl. Phys., vol. 65, pp. 993-998, 1989.
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 993-998
-
-
Metze, A.1
Ernie, D.W.2
Oskam, H.J.3
-
39
-
-
0000528150
-
Ion bombardment in rf plasmas
-
J. Liu, G. L. Huppert, and H. H. Sawin, "Ion bombardment in rf plasmas," J. Appl Phys., vol. 68, pp. 3916-3934, 1990.
-
(1990)
J. Appl Phys.
, vol.68
, pp. 3916-3934
-
-
Liu, J.1
Huppert, G.L.2
Sawin, H.H.3
-
40
-
-
0032624108
-
Effects of tube length and radius for inner surface plasma immersion ion implantation using an auxiliary electrode
-
Jan.
-
D. T. K. Kwok, Z. M. Zenh, P. Chu, and T. E. Sheridan, "Effects of tube length and radius for inner surface plasma immersion ion implantation using an auxiliary electrode," IEEE Trans. Plasma Sci., vol. 27, pp. 225-238, Jan. 1999.
-
(1999)
IEEE Trans. Plasma Sci.
, vol.27
, pp. 225-238
-
-
Kwok, D.T.K.1
Zenh, Z.M.2
Chu, P.3
Sheridan, T.E.4
-
41
-
-
0013466155
-
Influence of surface topography on ion trajectories in low-pressure plasma etching
-
M. Ardehali and H. Matsumoto, "Influence of surface topography on ion trajectories in low-pressure plasma etching," J. Appl. Phys., vol. 72, pp. 4995-4997, 1992.
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 4995-4997
-
-
Ardehali, M.1
Matsumoto, H.2
|