Kinetic roughening of amorphous silicon during hot-wire chemical vapor deposition at low temperature

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Sperling, Brent A ^a   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; ELLIPSOMETRY; LOW TEMPERATURE EFFECTS; PERTURBATION TECHNIQUES; SURFACE ROUGHNESS;

HEIGHT-DIFFERENCE; HOT-WIRE CHEMICAL VAPOR DEPOSITION; KINETIC ROUGHENING; ROOT-MEAN-SQUARED ROUGHNESS;

AMORPHOUS SILICON;

EID: 33847756721     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2424527     Document Type: Article

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