Elementary processes in silicon hot wire CVD

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 26-30

  Nakamura, Seigo ^a   Koshi, Mitsuo ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Amorphous; Catalytic CVD; Elementary reactions; Silane

Indexed keywords

CATALYSIS; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); REACTION KINETICS; THIN FILMS; WIRE;

AMORPHOUS; CATALYTIC CVD; ELEMENTARY REACTIONS; GROWTH CONDITIONS;

SILICON;

EID: 32644439431     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.095     Document Type: Conference Paper

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