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Volumn 65, Issue 3, 2002, Pages 353111-353118
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Surface transport kinetics in low-temperature silicon deposition determined from topography evolution
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
GLASS;
HELIUM;
HYDROGEN;
SILANE;
SILICON;
ADSORPTION;
ARTICLE;
DIFFUSION;
EXPERIMENTAL MODEL;
FILM;
LOW TEMPERATURE;
MOLECULAR DYNAMICS;
SURFACE PROPERTY;
TEMPERATURE DEPENDENCE;
THICKNESS;
TRANSPORT KINETICS;
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EID: 0037080625
PISSN: 01631829
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (62)
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References (27)
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