Surface roughness and structural aspects of anodic and cathodic plasma deposited a-Si:H at low temperature

Journal of Non-Crystalline Solids

Volumn 349, Issue 1-3, 2004, Pages 285-290

  Dalakos, George T ^a   Plawsky, Joel L ^b   Persans, Peter D ^b  

^a GE GLOBAL RESEARCH   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEGRADATION; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

CATHODIC PLASMA; LASER MIRRORS; OPTICAL SCATTERING; PROCESSING PARAMETERS;

SILICON;

EID: 9744285007     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.08.187     Document Type: Conference Paper

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