Correlation of real time spectroellipsometry and atomic force microscopy measurements of surface roughness on amorphous semiconductor thin films

Applied Physics Letters

Volumn 69, Issue 9, 1996, Pages 1297-1299

  Koh, Joohyun ^a   Lu, Yiwei ^a,d   Wronski, C R ^a,e   Kuang, Yalei ^a   Collins, R W ^a,e   Tsong, T T ^b   Strausser, Y E ^c  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b INSTITUTE OF PHYSICS   (Taiwan)

^c Digital Instruments   (United States)

^d Rudolph Research Corp   (United States)

^e Department of Electrical Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; ELLIPSOMETRY; MATHEMATICAL MODELS; THIN FILMS;

AMORPHOUS SILICON CARBON ALLOYS; EFFECTIVE MEDIUM THEORY; SPECTROELLIPSOMETRY; VOIDS;

ROUGHNESS MEASUREMENT;

EID: 0030211909     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117397     Document Type: Article

References (13)

1. Proceedings of the First International Conference on Spectroscopic Ellipsometry, edited by A. C. Boccara, C. Pickering, and J. Rivory (Elsevier, Amsterdam, 1993).
2. D. E. Aspnes, J. B. Theeten, and F. Hottier, Phys. Rev. B 20, 3292 (1979).
3. G. A. Niklasson, C. G. Granqvist, and O. Hunderi, Appl. Opt. 20, 26 (1981).
4. D. E. Aspnes, Thin Solid Films 89, 249 (1982).
5. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).
6. R. W. Collins, I. An, H. V. Nguyen, Y. Li, and Y. Lu, in Physics of Thin Films edited by K. Vedam (Academic, New York, 1994), Vol. 19, p. 49.
7. I. An, H. V. Nguyen, A. R. Heyd, and R. W. Collins, Rev. Sci. Instrum. 65, 3489 (1994).
8. Y. Lu, I. An, M. Gunes, M. Wakagi, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 63, 2228 (1993).
9. J. Koh, Y. Lu, S. Kim, J. S. Burnham, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 67, 2669 (1995).
10. i does not start from 0 in Fig. 2 is a result of a CVD process in which a-Si:B:H forms prior to plasma ignition.
11. N. Maley, I. Szafranek, L. Mandrell, M. Katiyar, J. R. Abelson, and J. A. Thornton, J. Non-Cryst. Solids 114, 163 (1989).
12. Y. Toyoshima, K. Arai, A. Matsuda, and K. Tanaka, Appl. Phys. Lett. 57, 1028 (1990).
13. K. Ikuta, K. Tanaka, S. Yamasaki, K. Miki, and A. Matsuda, Appl. Phys. Lett. 65, 1760 (1994).