Noise-induced roughening evolution of amorphous si films grown by thermal evaporation

Physical Review Letters

Volumn 76, Issue 20, 1996, Pages 3774-3777

  Yang, H N ^a   Zhao, Y P ^a   Wang, G C ^a   Lu, T M ^a  

^a Research Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4244076431     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.76.3774     Document Type: Article

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