Extended phase diagrams for guiding plasma-enhanced chemical vapor deposition of silicon thin films for photovoltaics applications

Applied Physics Letters

Volumn 80, Issue 15, 2002, Pages 2666-2668

  Ferlauto, A S ^a   Koval, R J ^a   Wronski, C R ^a   Collins, R W ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; GROWTH REGIME; HYDROGENATED SILICON; INTRINSIC LAYER; PHOTOVOLTAICS; REAL TIME SPECTROSCOPIC ELLIPSOMETRY; RF-PECVD; SILICON THIN FILM; SURFACE-ROUGHENING;

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; OPTIMIZATION; PHASE DIAGRAMS; PLASMA DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 79956057171     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1469661     Document Type: Article

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