Catalytic decomposition of SiH4 on a hot filament

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 42-46

  Tange, Shinya ^a   Inoue, Keisuke ^a   Tonokura, Kenichi ^a   Koshi, Mitsuo ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Chemical kinetics; Hot filament CVD; REMPI; Silanes

Indexed keywords

CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DESORPTION; MASS SPECTROMETRY; MULTIPHOTON PROCESSES; PHOTOIONIZATION; REACTION KINETICS; TUNGSTEN; ULTRAVIOLET RADIATION;

CATALYTIC DECOMPOSITION; RESONANCE ENHANCED MULTI-PHOTON IONIZATION (REMPI);

SILANES;

EID: 0035801092     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01204-4     Document Type: Conference Paper

References (15)