Plasma uniformity of inductively coupled plasma reactor with helical heating coil

IEEE Transactions on Plasma Science

Volumn 29, Issue 2 II, 2001, Pages 383-387

  Kang, Bongkoo ^a,b   Park, Jong Chul ^c   Kim, Young Hwan ^a,b  

^a Department of Electrical Engineering ^*

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

Helical resonator; Inductively coupled plasma; Plasma source; RF heating

Indexed keywords

CAPACITANCE; ELECTRIC INDUCTORS; HEATING; PLASMA DENSITY; RESONANCE;

INDUCTIVELY COUPLED PLASMA (ICP) SOURCES;

PLASMA SOURCES;

EID: 0035302499     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.922750     Document Type: Article

References (15)

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