PECVD of hydrogenated diamond-like carbon films from CH4-Ar mixtures: Growth chemistry and material characteristics

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1361-1365

  Cicala, G ^a   Bruno, P ^a   Losacco, A M ^b  

^a UNIVERSITY OF BARI   (Italy)

^b Centro Laser   (Italy)

Author keywords

CH4 Ar plasmas; Hydrogenated diamond like carbon films; Material properties; Optical emission

Indexed keywords

ARGON; DIAMONDS; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DEPOSITION RATE; GROWTH PROCESSES;

THIN FILMS;

DIAMOND;

EID: 2442428279     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.049     Document Type: Article

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