Influence of DC biasing on the formation of hydrogenated amorphous carbon films using a plasma-based ion implantation technique

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 10, 2002, Pages 6165-6168

  Watanabe, Toshiya ^a,b   Yamamoto, Kazuhiro ^a   Tsuda, Osamu ^a   Tanaka, Akihiro ^a   Koga, Yoshinori ^a   Takai, Osamu ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Carbon film; Chemical bonding; ECR plasma with a mirror field; Plasma based ion implantation; Tribological property

Indexed keywords

AMORPHOUS FILMS; ELECTRON CYCLOTRON RESONANCE; FRICTION; HYDROGENATION; INTERFACES (MATERIALS); ION IMPLANTATION; MIXING; SYNTHESIS (CHEMICAL); TRIBOLOGY;

CARBON FILM; PLASMA BASED ION IMPLANTATION; PULSE BIASING;

CARBON;

EID: 0036818895     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.6165     Document Type: Article

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