The effect of the substrate bias voltage and the deposition pressure on the properties of diamond-like carbon produced by inductively coupled plasma assisted chemical vapor deposition

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 255-258

  Kim, H ^a   Jung, D H ^a   Park, B ^a   Yoo, K C ^a   Lee, J J ^a   Joo, J H ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

CVD; Diamond like carbon; Inductively coupled plasma

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGEN; INDUCTIVELY COUPLED PLASMA;

DEPOSITION PRESSURES; FILM HARDNESS; GAS MIXTURES; SUBSTRATE BIAS VOLTAGE;

DIAMOND LIKE CARBON FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 13844255004     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.027     Document Type: Article

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