Deposition of Diamond-like Carbon Film in a Closed-space CH4 RF Plasma

Plasma Chemistry and Plasma Processing

Volumn 22, Issue 4, 2002, Pages 607-617

  Mutsukura, N ^a   Handa, Y ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Diamond like films; Mass spectrometry; RF plasma deposition

Indexed keywords

DIAMOND LIKE CARBON FILMS; ION BEAM ASSISTED DEPOSITION; MASS SPECTROMETRY; PLASMA DENSITY; PLASMA ETCHING; SPUTTER DEPOSITION;

PLASMA DEPOSITIONS;

PLASMA APPLICATIONS;

EID: 0036449559     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021375730864     Document Type: Article

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