메뉴 건너뛰기




Volumn 21, Issue 3, 2004, Pages 746-751

Analysis of langmuir probe data in high density plasmas

Author keywords

Electron Temperature; Langmuir Probe; Parametrization; Plasma; Plasma Density

Indexed keywords

DEUTERIUM; ELECTRODES; ELECTROMECHANICAL DEVICES; ENERGY DISSIPATION; EXTRACTION; GAS DYNAMICS; IONIZATION; PARAMETER ESTIMATION; PLASMA DENSITY; STANDBY POWER SYSTEMS;

EID: 3242749688     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02705515     Document Type: Article
Times cited : (6)

References (22)
  • 2
    • 0005094455 scopus 로고    scopus 로고
    • Anisotropic neutral stream etching of electronics materials
    • Mathad, G. S. and Meyyappan, M., eds.
    • Chen, L. and Yang, Q., "Anisotropic Neutral Stream Etching of Electronics Materials," Electrochem. Soc. Symp. Proc., Mathad, G. S. and Meyyappan, M., eds., 96-12, 332 (1996).
    • (1996) Electrochem. Soc. Symp. Proc. , vol.96 , Issue.12 , pp. 332
    • Chen, L.1    Yang, Q.2
  • 3
    • 0034314706 scopus 로고    scopus 로고
    • Direct pattern etching for micromachining applications without the use of a resist mask
    • Cho, B.-O., Ryu, J.-H., Hwang, S.-W., Lee, G.-R. and Moon, S. H., "Direct Pattern Etching for Micromachining Applications without the Use of a Resist Mask," J. Vac. Sci. Techol., B 18, 2769 (2000).
    • (2000) J. Vac. Sci. Techol., B , vol.18 , pp. 2769
    • Cho, B.-O.1    Ryu, J.-H.2    Hwang, S.-W.3    Lee, G.-R.4    Moon, S.H.5
  • 5
    • 0017943201 scopus 로고
    • Plasma diagnostics with electric probes
    • Clements, R. M., "Plasma Diagnostics with Electric Probes," J. Vac. Sci. Technol., 15, 193 (1978).
    • (1978) J. Vac. Sci. Technol. , vol.15 , pp. 193
    • Clements, R.M.1
  • 6
    • 0023384735 scopus 로고
    • The use of langmuir probes and optical emission spectroscopy to measure electron energy distribution functions in RF-generated argon plasmas
    • Cox, T. I., Deshmukh, V. G. I., Hope, D. A. O., Hydes, A. J., Braithwaite, N. St. J. and Benjamin, N. M. P., "The Use of Langmuir Probes and Optical Emission Spectroscopy to Measure Electron Energy Distribution Functions in RF-Generated Argon Plasmas," J. Phys. D: Appl. Phys., 20, B20(1987).
    • (1987) J. Phys. D: Appl. Phys. , vol.20
    • Cox, T.I.1    Deshmukh, V.G.I.2    Hope, D.A.O.3    Hydes, A.J.4    Braithwaite, N.St.J.5    Benjamin, N.M.P.6
  • 7
    • 0033735086 scopus 로고    scopus 로고
    • Modeling and simulation of plasma etching reactors for microelectronics
    • Economou, D. J., "Modeling and Simulation of Plasma Etching Reactors for Microelectronics," Thin Solid Films, 365, 348 (2000).
    • (2000) Thin Solid Films , vol.365 , pp. 348
    • Economou, D.J.1
  • 8
    • 36149029741 scopus 로고
    • Measurements of electron energy distribution in low-pressure RF discharges
    • Godyak, V. A., Piejak, R. B. and Alexandrovich, B. M., "Measurements of Electron Energy Distribution in Low-Pressure RF Discharges," Plasma Sources Sci. Technol., 1, 36 (1992).
    • (1992) Plasma Sources Sci. Technol. , vol.1 , pp. 36
    • Godyak, V.A.1    Piejak, R.B.2    Alexandrovich, B.M.3
  • 9
    • 0030551131 scopus 로고    scopus 로고
    • Measurements of electron temperature, electron density, and neutral density in a radio-frequency inductively coupled plasma
    • Hori, T., Bowden, M. D., Uchino, K., Muraoka, K. and Maeda, M., "Measurements of Electron Temperature, Electron Density, and Neutral Density in a Radio-Frequency Inductively Coupled Plasma," J. Vac. Sci. Technol., A 14, 144 (1996).
    • (1996) J. Vac. Sci. Technol., A , vol.14 , pp. 144
    • Hori, T.1    Bowden, M.D.2    Uchino, K.3    Muraoka, K.4    Maeda, M.5
  • 10
    • 0442295437 scopus 로고    scopus 로고
    • Thickness of a modified surface layer formed in a silsesquioxane-based low-k material during etching in a fluorocarbon plasma
    • Hwang, S.-W., Lee, G.-R., Min, J.-H. and Moon, S. H., "Thickness of a Modified Surface Layer Formed in a Silsesquioxane-based Low-k Material During Etching in a Fluorocarbon Plasma," Korean J. Chem. Eng., 20, 1131 (2003).
    • (2003) Korean J. Chem. Eng. , vol.20 , pp. 1131
    • Hwang, S.-W.1    Lee, G.-R.2    Min, J.-H.3    Moon, S.H.4
  • 11
    • 0011405431 scopus 로고
    • Theory of spherical and cylindrical langmuir probes in a collisionless, maxwellian plasma at rest
    • Laframboise, J. G., "Theory of Spherical And Cylindrical Langmuir Probes in a Collisionless, Maxwellian Plasma at Rest," Univ. of Toronto List. Aerospace Studies Report No. 100 (1966).
    • (1966) Univ. of Toronto List. Aerospace Studies Report No. 100 , vol.100
    • Laframboise, J.G.1
  • 17
    • 0001435610 scopus 로고
    • A tuned langmuir probe for measurements in RF glow discharges
    • Paranjpe, A. P., McVittie, J. P. and Self, S. A., "A Tuned Langmuir Probe for Measurements in RF Glow Discharges," J. Appl. Phys., 67, 6718 (1990).
    • (1990) J. Appl. Phys. , vol.67 , pp. 6718
    • Paranjpe, A.P.1    McVittie, J.P.2    Self, S.A.3
  • 18
    • 0037838979 scopus 로고    scopus 로고
    • Trajectories of ions inside a faraday cage located in a high density plasma etcher
    • Ryu, J.-H., Cho, B.-O., Hwang, S.-W., Moon, S. H. and Kim, C.-K., "Trajectories of Ions inside a Faraday Cage Located in a High Density Plasma Etcher," Korean J. Chem. Eng., 20, 407 (2003).
    • (2003) Korean J. Chem. Eng. , vol.20 , pp. 407
    • Ryu, J.-H.1    Cho, B.-O.2    Hwang, S.-W.3    Moon, S.H.4    Kim, C.-K.5
  • 19
    • 0031101854 scopus 로고    scopus 로고
    • Langmuir probe measurements in an inductively coupled plasma source
    • Schwabedissen, A., Benck, E. C. and Roberts, J. R., "Langmuir Probe Measurements in an Inductively Coupled Plasma Source," Phys. Rev. E., 55, 3450 (1997).
    • (1997) Phys. Rev. E. , vol.55 , pp. 3450
    • Schwabedissen, A.1    Benck, E.C.2    Roberts, J.R.3
  • 20
    • 21144471247 scopus 로고
    • 2 plasmas produced by an electron cyclotron resonance microwave source
    • 2 Plasmas Produced by an Electron Cyclotron Resonance Microwave Source," J. Vac. Sci. Technol., A10, 3119 (1992).
    • (1992) J. Vac. Sci. Technol., A , vol.10 , pp. 3119
    • Shatas, A.A.1    Hu, Y.Z.2    Irene, E.A.3
  • 21
    • 84858871084 scopus 로고
    • A new method for analyzing langmuir probe data and the determination of ion densities and etch yields in an etching plasma
    • Steinbruchel, C., "A New Method for Analyzing Langmuir Probe Data and the Determination of Ion Densities and Etch Yields in an Etching Plasma," J. Vac. Sci. Technol., A 8, 1663 (1990).
    • (1990) J. Vac. Sci. Technol., A , vol.8 , pp. 1663
    • Steinbruchel, C.1
  • 22
    • 0000876565 scopus 로고    scopus 로고
    • Rapid twodimensional self-consistent simulation of inductively coupled plasma and comparison with experimental data
    • Wise, R. S., Lymberopoulos, D. P. and Economou, D. J., "Rapid TwoDimensional Self-Consistent Simulation of Inductively Coupled Plasma and Comparison with Experimental Data," Appi Phys. Lett., 68, 2499 (1996).
    • (1996) Appi Phys. Lett. , vol.68 , pp. 2499
    • Wise, R.S.1    Lymberopoulos, D.P.2    Economou, D.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.