Silicon and germanium nanoparticle formation in an inductively coupled plasma reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 860-864

  Gorla, C R ^a   Liang, S ^b   Tompa, G S ^c   Mayo, W E ^a   Lu, Y ^b  

^a RUTGERS UNIVERSITY   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c STRUCTURED MATERIALS INDUSTRIES INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013253889     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580721     Document Type: Article

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