Measurements and modeling of ion energy distributions in high-density, radio-frequency biased CF 4 discharges

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 6303-6314

  Sobolewski, Mark A ^a   Wang, Yicheng ^a   Goyette, Amanda ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS FREQUENCY; CAPACITIVE PROBE; FARADAY CUPS; HIGH DENSITY PLASMAS; HIGH-DENSITY; INDUCTIVELY COUPLED PLASMA REACTOR; INPUT PARAMETER; ION BOMBARDMENT ENERGY; ION DYNAMICS; ION ENERGY ANALYZER; ION ENERGY DISTRIBUTIONS; RADIO FREQUENCIES; RF BIAS; SIMULTANEOUS MEASUREMENT; TIME-DEPENDENT; TRANSIT TIME;

ION BOMBARDMENT; PLASMA SHEATHS;

DYNAMICS;

EID: 0037094651     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1467403     Document Type: Article

References (41)

1. M. A. Sobolewski, Phys. Rev. E 62, 8540 (2000). pre PLEEE8 1063-651X
2. D. Bose, T. R. Govindan, and M. Meyyappan, J. Appl. Phys. 87, 7176 (2000). jap JAPIAU 0021-8979
3. Y. D. Lee, S. S. Kim, S. H. Ku, and C. S. Chang, Phys. Plasmas 7, 766 (2000). php PHPAEN 1070-664X
4. C. Charles, A. W. Degeling, T. E. Sheridan, J. H. Harris, M. A. Lieberman, and R. W. Boswell, Phys. Plasmas 7, 5232 (2000). php PHPAEN 1070-664X
5. S. Rauf, J. Appl. Phys. 87, 7647 (2000). jap JAPIAU 0021-8979
6. E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, Plasma Sources Sci. Technol. 8, R45 (1999). pst PSTEEU 0963-0252
7. E. A. Edelberg and E. S. Aydil, J. Appl. Phys. 86, 4799 (1999). jap JAPIAU 0021-8979
8. T. Panagopoulos and D. J. Economou, J. Appl. Phys. 85, 3435 (1999). jap JAPIAU 0021-8979
9. P. A. Miller and M. E. Riley, J. Appl. Phys. 82, 3689 (1997). jap JAPIAU 0021-8979
10. N. Mizutani and T. Hayashi, Jpn. J. Appl. Phys., Part 2 36, L1470 (1997). jjc JAPLD8 0021-4922
11. R. J. Hoekstra and M. J. Kushner, J. Appl. Phys. 79, 2275 (1996). jap JAPIAU 0021-8979
12. D. Martin and H. Oechsner, Vacuum 47, 1017 (1996). vac VACUAV 0042-207X
13. M. S. Barnes, J. C. Forster, and J. H. Keller, IEEE Trans. Plasma Sci. 19, 240 (1991). tps ITPSBD 0093-3813
14. Y. Okamoto and H. Tamagawa, J. Phys. Soc. Jpn. 29, 187 (1970). jup JUPSAU 0031-9015
15. P. Benoit-Cattin and L. C. Bernard, J. Appl. Phys. 39, 5723 (1968). jap JAPIAU 0021-8979
16. M. A. Sobolewski, J. K. Olthoff, and Y. Wang, J. Appl. Phys. 85, 3966 (1999). jap JAPIAU 0021-8979
17. O. Tsuda, Y. Tatebayashi, Y. Y. Takamura, and T. Yoshida, Plasma Sources Sci. Technol. 8, 392 (1999). pst PSTEEU 0963-0252
18. Y. Hikosaka, H. Hayashi, M. Sekine, H. Tsuboi, M. Endo, and N. Mizutani, Jpn. J. Appl. Phys., Part 1 38, 4465 (1999). jjb JAPNDE 0021-4922
19. E. A. Edelberg, A. Perry, N. Benjamin, and E. S. Aydil, J. Vac. Sci. Technol. A 17, 506 (1999). jva JVTAD6 0734-2101
20. N. Mizutani, Y. Nagata, A. Kubo, and T. Hayashi, Rev. Sci. Instrum. 69, 1918 (1998). rsi RSINAK 0034-6748
21. W. M. Holber and J. Forster, J. Vac. Sci. Technol. A 8, 3720 (1990). jva JVTAD6 0734-2101
22. R. H. Bruce, J. Appl. Phys. 52, 7064 (1981). jap JAPIAU 0021-8979
23. J. W. Coburn and E. Kay, J. Appl. Phys. 43, 4965 (1972). jap JAPIAU 0021-8979
24. P. J. Hargis, Jr. et al., Rev. Sci. Instrum. 65, 140 (1994). rsi RSINAK 0034-6748
25. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995). jri JRITEF 1044-677X
26. A. Schwabedissen, E. C. Benck, and J. R. Roberts, Phys. Rev. E 55, 3450 (1997). pre PLEEE8 1063-651X
27. R. Jayaraman, R. T. McGrath, and G. A. Hebner, J. Vac. Sci. Technol. A 17, 1545 (1999). jva JVTAD6 0734-2101
28. Y. Wang and J. K. Olthoff, J. Appl. Phys. 85, 6358 (1999). jap JAPIAU 0021-8979
29. M. A. Sobolewski, IEEE Trans. Plasma Sci. 23, 1006 (1995). tps ITPSBD 0093-3813
30. V. A. Godyak and R. B. Piejak, J. Appl. Phys. 68, 3157 (1990). jap JAPIAU 0021-8979
31. M. A. Sobolewski, Phys. Rev. E 59, 1059 (1999). pre PLEEE8 1063-651X
32. M. A. Lieberman, IEEE Trans. Plasma Sci. 16, 638 (1988). tps ITPSBD 0093-3813
33. V. A. Godyak and N. Sternberg, Phys. Rev. A 42, 2299 (1990). pra PLRAAN 1050-2947
34. D. Bohm, in The Characteristics of Electrical Dischares in Magnetic Fields, edited by A. Guthrie and R. K. Wakerling (McGraw-Hill, New York, 1949), p. 77.
35. R. N. Franklin, J. Phys. D 33, 3186 (2000). jpd JPAPBE 0022-3727
36. M. S. Benilov, IEEE Trans. Plasma Sci. 28, 2207 (2000). tps ITPSBD 0093-3813
37. H. Singh and D. B. Graves, J. Appl. Phys. 88, 3889 (2000). jap JAPIAU 0021-8979
38. M. Edamura and E. C. Benck (private communication).
39. M. A. Sobolewski, J. Appl. Phys. 90, 2660 (2001). jap JAPIAU 0021-8979
40. J. R. Woodworth, M. E. Riley, D. C. Meister, B. P. Aragon, M. S. Le, and H. H. Sawin, J. Appl. Phys. 80, 1304 (1996). jap JAPIAU 0021-8979
41. A. D. Kuypers and H. J. Hopman, J. Appl. Phys. 67, 1229 (1990). jap JAPIAU 0021-8979