Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrystalline diamond deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1988-1992

  Okada, Katsuyuki ^a   Komatsu, Shojiro ^a   Matsumoto, Seiichiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (SPECIFIC GRAVITY); DEPOSITION; DIAMONDS; ELECTRON ENERGY LEVELS; GLOW DISCHARGES; ION BOMBARDMENT; IONIZATION; MASS SPECTROMETRY; MOLECULAR STRUCTURE; NANOSTRUCTURED MATERIALS; PLASMAS; PROBES;

LANGMUIR PROBE; NANOCARBON DIAMOND DEPOSITION; PLASMA POTENTIALS; QUADRUPOLE MASS SPECTROMETER; SECONDARY ION MOLECULAR REACTIONS;

HYDROCARBONS;

EID: 0842301333     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621404     Document Type: Article

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