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Journal of the Electrochemical Society

Volumn 151, Issue 11, 2004, Pages

In situ modification of rf sputter-deposited lithium nickel oxide thin films by plasma irradiation

(1) Chiu, K F a

a FENG CHIA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; INDUCTIVELY COUPLED PLASMA; IRRADIATION; LOW TEMPERATURE EFFECTS; NICKEL COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES;

FILM COMPOSITION; FILM MORPHOLOGY; PLASMA IRRADIATION; PLASMA-MODIFIED THIN FILMS;

THIN FILMS;

EID: 10944250439 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1803572 Document Type: Article

Times cited : (14)

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