메뉴 건너뛰기




Volumn 82, Issue 3, 2003, Pages 346-348

Ultrarapid nanostructuring of poly(methylmethacrylate) films using Ga+ focused ion beams

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTOMERS; ION BEAMS; ION BOMBARDMENT; NANOTECHNOLOGY; PLASTICS MOLDING; POLYMETHYL METHACRYLATES; POSITIVE IONS; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0037455249     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1536252     Document Type: Article
Times cited : (15)

References (14)
  • 7
    • 0013143023 scopus 로고    scopus 로고
    • note
    • Note that PMMA is also a sensitive electron resist, so these observations were made with the minimum possible electron dose. Differential contrast does disappear after extended (̃tens of seconds) continuous electron irradiation.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.