Large-field particle beam optics for projection and proximity printing and for maskless lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 1, 2003, Pages 34-48

  Loeschner, Hans ^a   Stengl, Gerhard ^a   Buschbeck, Herbert ^a   Chalupka, Alfred ^a   Lammer, Gertraud ^a   Platzgummer, Elmar ^a   Vonach, Herbert ^a   De Jager, Patrick W H ^b   Kaesmaier, Rainer ^c   Ehrmann, Albrecht ^c   Hirscher, Stefan ^c   Wolter, Andreas ^c   Dietzel, Andreas ^d   Berger, Rüdiger ^d   Grimm, Hubert ^d   Terris, Bruce D ^e   Bruenger, Wilhelm H ^f   Gross, Gerhard ^g   Fortagne, Olaf ^g   Adam, Dieter ^g   Böhm, Michael ^g   Eichhorn, Hans ^g   Springer, Reinhard ^h   Butschke, Joerg ^h   Letzkus, Florian ^h   Ruchhoeft, Paul ⁱ   Wolfe, John C ⁱ   more..

^a IMS NANOFABRICATION AG   (Austria)

^b TNO   (Netherlands)

^c INFINEON TECHNOLOGIES AG   (Germany)

^d IBM   (Germany)

^e IBM ALMADEN RESEARCH CENTER   (United States)

^f FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^g Vistec Electron Beam GmbH   (Germany)

^h Institut fur Mikroelektronik Stuttgart   (Germany)

ⁱ UNIVERSITY OF HOUSTON   (United States)

Author keywords

Ion beam proximity printing; Ion projection lithography (IPL); Lithography on nonplanar substrates (curved surfaces); Maskless lithography (ML2); Patterned magnetic media

Indexed keywords

EID: 3843051808     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1528946     Document Type: Article

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