Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing

Applied Physics Letters

Volumn 85, Issue 3, 2004, Pages 476-478

  Ansari, K ^a   Van Kan, J A ^a   Bettiol, A A ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; CURRENT DENSITY; DELAMINATION; ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; HARDNESS; METAL STAMPING; METALLIZING; NANOSTRUCTURED MATERIALS; POLYMETHYL METHACRYLATES; PROTECTIVE COATINGS; PROTON BEAMS; SURFACE ROUGHNESS;

FOCUSED ION BEAMS (FIB); METALLIC STAMPS; NANOIMPRINT LITHOGRAPHY; PROTON BEAM WRITING (PBW);

NANOTECHNOLOGY;

EID: 4043173302     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1773933     Document Type: Article

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