Heavy ion projection beam system for material modification at high ion energy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 246-249

  Weidenmuller U ^a   Meijer, J ^a   Stephan, A ^a   Bukow, H H ^a   Sossna, E ^b   Volland, B ^b   Rangelow, I W ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CURRENT DENSITY; ELECTROSTATICS; ETCHING; HEAT CONDUCTION; IMAGING TECHNIQUES; ION IMPLANTATION; MAGNETIC FIELD EFFECTS; PHOTORESISTS; POLYMETHYL METHACRYLATES; PROJECTION SYSTEMS; SCANNING ELECTRON MICROSCOPY; SOLENOIDS; SUBSTRATES; THERMAL STRESS;

ION ENERGIES; ION PROJECTION BEAM SYSTEMS;

ION BEAMS;

EID: 0036125075     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1434975     Document Type: Conference Paper

References (6)