Microcontact printing: New mastering and transfer techniques for high throughput, resolution and depth of focus

Materials Science and Engineering C

Volumn 19, Issue 1-2, 2002, Pages 383-392

  Hull, R ^a   Chraska, T ^a   Liu, Y ^a   Longo, D ^a  

^a University of Virginia   (United States)

Author keywords

Focused ion beam; Nanolithography; Soft lithography; Topographic master

Indexed keywords

ELASTOMERS; GRAIN SIZE AND SHAPE; ION BEAMS; METALLIC FILMS; MICROMACHINING; MOLDING; PRINTING; SILVER;

FOCUSED ION BEAMS (FIB); MICROCONTACT PRINTING;

POLYMETHYL METHACRYLATES;

PRINTING;

ELASTOMERS; MOLDING; PRINTING;

EID: 0037005969     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(01)00426-X     Document Type: Article

References (13)