Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 721-728

  Lehrer, C ^a   Frey, L ^a   Petersen, S ^a   Sulzbach, T ^a   Ohlsson, O ^a   Dziomba, T ^a   Danzebrink, H U ^a   Ryssel, H ^a  

^a FIIS   (Germany)

Author keywords

Atomic force microscopy; Focused ion beam; Nano machining; Scanning near field optical microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS FIBERS; ION BEAMS; MACHINING; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB) NANO MACHINING; SILICON APERTURE PROBES;

PROBES;

EID: 19244383874     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00463-4     Document Type: Article

References (13)

1. Angular dependence of sputtering yields of monatomic solids