Focused ion beam micromachining of GaN photonic devices

MRS Internet Journal of Nitride Semiconductor Research

Volumn 4, Issue SUPPL. 1, 1999, Pages

  Chyr, Irving ^a   Steckl, A J ^a  

^a 705 Engineering Research Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; FABRICATION; ION BEAMS; MASKS; MIRRORS; REACTIVE ION ETCHING; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

OPTICAL LOSSES; OPTICAL MASKS;

GALLIUM NITRIDE;

EID: 3442901444     PISSN: 10925783     EISSN: None     Source Type: Journal    
DOI: 10.1557/s1092578300003604     Document Type: Conference Paper

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