Biased resistor network model for electromigration failure and related phenomena in metallic lines

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 17, 2004, Pages 1-15

  Pennetta, C ^a,b   Alfinito, E ^a,b   Reggiani, L ^a,b   Fantini, F ^c   De Munari, I ^d   Scorzoni, A ^e  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b UNIVERSITY OF SALENTO   (Italy)

^c UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^d INFM   (Italy)

^e UNIVERSITY OF PERUGIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY; ALUMINUM; COPPER; METAL;

ARTICLE; DENSITY; ELECTRIC CURRENT; ELECTRIC RESISTANCE; ELECTRON; EXPERIMENT; HEATING; MATHEMATICAL ANALYSIS; MECHANICAL STRESS; MONTE CARLO METHOD; NOISE; RESISTOR; SIMULATION; STATISTICS; STEADY STATE; THEORY;

EID: 12244299190     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.174305     Document Type: Article

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